Hyun-Sang Joo

Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology

We have already reported the resist using a ring opened polymer of maleic anhydride unit (ROMA). The synthesis of the ROMA polymer is as follows: 1)copolymerization of cycloolefin derivatives and maleic anhydride 2)ring opening reaction of maleic anhydride unit. 3)substitution reaction of pendant group. The ROMA Polymer has several good properties such as UV transmittance, pattern profile, PED stability and storage stability. Especially, we have been known that the resist using a ROMA polymer has a good character for application of Resist Flow Process(RFP), recently. The ROMA polymer has shown various Tg value ranging from 100°C to 170°C in accordance with substituents and substituted degree. The resist made by ROMA polymer as a matrix resin showed a good lithographic performance at direct C/H pattern. We also got a good C/H pattern profile by resist flow process at sub-100nm hole size. In this study we will discuss about it and illustrate about various Tg value of ROMA polymers and data gotten by means of resist flow process.

Novel approach for high resolution using cycloolefin-alt-maleic acid derivatives polymer for ArF lithography

Polyacrylate derivative was first developed as raw material for ArF resist and it was selected the first candidate in spite of some defects. Cycloolefin-maleic anhydride polymer[COMA] and other polymers were therefore given opportunity. The resist based on COMA shows a good dry-etch resistance compared with that based on acrylate polymer. However, the pattern profile of the resist formulated by using COMA has some defects such as taper and low resolution because of transmittance issue of the polymer. In order to solve the issue, we have developed a new polymer [It was named ROMA Resin]. The new polymer has good physical properties such as UV transmittance, stability during storage and moderate glass transition temperature. We also found that the pattern profile of the resist formulated by using the polymer shows good results in terms of pattern profile, CD SEM slimming and PED stability.