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Dive into the research topics where Hyunseok Kim is active.

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Featured researches published by Hyunseok Kim.


Physical Review B | 2003

Three-stage nucleation and growth of Ge self-assembled quantum dots grown on partially relaxed SiGe buffer layers

Hyunseok Kim; Zuoming Zhao; Ya-Hong Xie

We investigate the magnetic field inversion symmetry of the pumped currents in quantum pumps with various discrete symmetries using Floquet scattering matrix approach. We found the pumped currents can have symmetries


Nano Letters | 2016

Monolithically Integrated InGaAs Nanowires on 3D Structured Silicon-on-Insulator as a New Platform for Full Optical Links

Hyunseok Kim; Alan C. Farrell; Pradeep Senanayake; Wook-Jae Lee; Diana L. Huffaker

I(B,phi) = -I(-B,-phi)


Applied Physics Letters | 2001

Influence of the wetting-layer growth kinetics on the size and shape of Ge self-assembled quantum dots on Si(001)

Hyunseok Kim; Ya-Hong Xie

and


Journal of Crystal Growth | 2003

Influence of a buried misfit dislocation network on the pyramid-to-dome transition size of Ge self-assembled quantum dots on Si(001)

Hyunseok Kim; J.Y. Chang; Ya-Hong Xie

I(B,phi) = I(-B,-phi)


Nano Letters | 2017

Monolithic InGaAs Nanowire Array Lasers on Silicon-on-Insulator Operating at Room Temperature

Hyunseok Kim; Wook-Jae Lee; Alan C. Farrell; Juan Salvador Dominguez Morales; Pradeep Senanayake; Sergey V. Prikhodko; Tomasz J. Ochalski; Diana L. Huffaker

, where


Applied Physics Letters | 2016

Improved room-temperature luminescence of core-shell InGaAs/GaAs nanopillars via lattice-matched passivation

Katarzyna Komolibus; Adam C. Scofield; Kamil Gradkowski; Tomasz J. Ochalski; Hyunseok Kim; Diana L. Huffaker; Guillaume Huyet

phi


Applied Physics Letters | 2016

Nanopillar array band-edge laser cavities on silicon-on-insulator for monolithic integrated light sources

Wook-Jae Lee; Hyunseok Kim; Alan C. Farrell; Pradeep Senanayake; Diana L. Huffaker

is the phase difference of two time dependent perturbations, depending on the discrete symmetry considered. The results in the adiabatic limit for each discrete symmetry are compared with those of Brouwers formula.


Nano Letters | 2017

Telecom-Wavelength Bottom-up Nanobeam Lasers on Silicon-on-Insulator

Hyunseok Kim; Wook-Jae Lee; Alan C. Farrell; Akshay Balgarkashi; Diana L. Huffaker

Monolithically integrated III-V semiconductors on a silicon-on-insulator (SOI) platform can be used as a building block for energy-efficient on-chip optical links. Epitaxial growth of III-V semiconductors on silicon, however, has been challenged by the large mismatches in lattice constants and thermal expansion coefficients between epitaxial layers and silicon substrates. Here, we demonstrate for the first time the monolithic integration of InGaAs nanowires on the SOI platform and its feasibility for photonics and optoelectronic applications. InGaAs nanowires are grown not only on a planar SOI layer but also on a 3D structured SOI layer by catalyst-free metal-organic chemical vapor deposition. The precise positioning of nanowires on 3D structures, including waveguides and gratings, reveals the versatility and practicality of the proposed platform. Photoluminescence measurements exhibit that the composition of ternary InGaAs nanowires grown on the SOI layer has wide tunability covering all telecommunication wavelengths from 1.2 to 1.8 μm. We also show that the emission from an optically pumped single nanowire is effectively coupled and transmitted through an SOI waveguide, explicitly showing that this work lays the foundation for a new platform toward energy-efficient optical links.


Journal of Vacuum Science & Technology B | 2004

On the formation mechanism of epitaxial Ge islands on partially relaxed SiGe buffer layers

Hyunseok Kim; Jie Liu; Zuoming Zhao; Ya-Hong Xie

The growth temperature of the wetting layer is used as the key variable in the study of a series of Ge self-assembled quantum dots on Si(001) substrates. A relaxed SiGe buffer layer is used for most of the samples as a means of maintaining the density of Ge dots. Ge dots are in the shapes of pyramids, domes, and superdomes, similar to those reported in the literature. A significant difference in the fraction of pyramids is observed between samples with wetting layers grown at low (280u200a°C) and high (650u200a°C) temperatures. This difference is in turn dependent on the total amount of Ge deposited or equivalently, the average size of dots. These observations point to the presence of Si during the initial stage of Ge dot formation and that the fraction of pyramids as well as the critical size for the transition from pyramids to domes are influenced by the presence of Si.


arXiv: Mesoscale and Nanoscale Physics | 2018

Enhanced interlayer neutral excitons and trions in trilayer van der Waals heterostructures

Chanyeol Choi; Jiahui Huang; Hung-Chieh Cheng; Hyunseok Kim; Abhinav Kumar Vinod; Sang-Hoon Bae; V. Ongun Özçelik; Roberto Grassi; Jongjae Chae; Shu-Wei Huang; Xiangfeng Duan; Kristen Kaasbjerg; Tony Low; Chee Wei Wong

The critical sizes of the pyramid-to-dome transition of Ge self-assembled quantum dots (SAQDs) grown on relaxed SiGe buffer layers were investigated for the relationship between the misfit strain built in dots and nucleation sites. The strain field of arrays of buried dislocations in a relaxed SiGe buffer layer provided preferential nucleation sites for quantum dots. Burgers vector analysis using plan-view transmission electron microscopy verified that the preferential nucleation sites of Ge SAQDs depended on the Burgers vector direction of corresponding dislocations. The measurement of the lateral distance between SAQDs and dislocations clarified that the location of SAQDs was at the intersection of the dislocation slip plane and the top surface. The samples are fabricated to contain low dislocation densities. The average dislocation spacing is larger than the surface migration length of Ge adatoms, resulting in two groups of SAQDs, those that are located along the dislocations, and those that are not. Atomic force microscopy observations showed a distinctively larger critical size for Ge SAQDs grown over the intersection of the dislocation slip plane and the top surface than those grown in regions between dislocations. These experimental observations indicate that the critical size of the pyramid-to-dome transition is strongly dependent on misfit strain in SAQDs with lower strain being associated with a larger critical size.

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Wook-Jae Lee

University of California

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Ya-Hong Xie

University of California

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Zuoming Zhao

University of California

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Chanyeol Choi

University of California

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Chee Wei Wong

University of California

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Jongjae Chae

University of California

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