I.G. Brown

Ion charge state distributions in high current vacuum arc plasmas in a magnetic field

We have investigated the charge state distributions of metal ions produced in a high current vacuum arc plasma located in a strong magnetic field. The arc current was varied over the range 200 A to 4 kA and the magnetic field was from zero up to 10 kG. In general, the effect of both high arc current and high magnetic field is to push the distribution to higher charge states-the mean ion charge state is increased and new high charge states are formed. These effects are explained in terms of increased power input (higher plasma temperature) and delayed freezing of the charge state distribution during the plasma expansion process.

Measurements of the total ion flux from vacuum arc cathode spots

The ion current from different cathode materials was measured for 50-500 A of arc current. The ion current normalized by the arc current was found to depend on the cathode material, with values in the range from 5% to 19%. The normalized ion current was generally greater for elements of low cohesive energy. The ion erosion rates were determined from values of ion current and ion charge states, which were previously measured in the same ion source. The absolute ion erosion rates ranged from 16-173 /spl mu/g/C.

Cathodic arc deposition of copper oxide thin films

LBL-35678 UC-426 Submitted to Surface and Coatings Technology Cathodic Arc Deposition of Copper Oxide Thin Films R. A. MacGill, S. Anders, A. Anders, R. A. Castro, M. R. Dickinson, K. M. Yu and I. G. Brown Lawrence Berkeley Laboratory, University of California, Berkeley, CA 94720 May 23,1994 This work was supported by the Electric Power Research Institute under Contract RP 8042-03, and the U.S. Department of Energy, Division of Advanced Energy Projects, under Contract No. DE-AC03-76SF00098.

Emerging applications of vacuum-arc-produced plasma, ion and electron beams

Preface. Cohesive energy rule for vacuum arcs A. Anders. Physical basis of plasma parameter control in a vacuum arc I.A. Krinberg. Sources of multiply charged metal ions: vacuum discharge or laser produced plasma? V. Paperny. Status of E-MEVVA experiments at ITEP T.V. Kulevoy, et al. Underlying physics of E-MEVVA operation A. Herschcovich, et al. Technical design of the MEVVA ion source at GSI and results of a long uranium beam time period F. Heymach, et al. Simulation of the extraction from a MEVVA ion source P. Spadtke. Production of gas and metal ion beams with vacuum arc ion sources A.S. Bugaev, et al. High current electron sources and accelerators with plasma emitters V.I. Gushenets, P.M. Schanin. Emission methods of experimental investigations of ion velocities in vacuum arc plasmas A.S. Bugaev, et al. Gaseous plasma production using electron emitter based on arc discharge M.V. Shandrikov, et al. Vacuum arc ion sources: charge state enhancement and arc voltage M. Galonska, et al. Linear vacuum arc evaporators for deposition of functional multi-purpose coatings A.V. Demchyshyn, et al. Arc generators of low temperature plasma and their applications N.N. Koval, P.M. Schanin. Electron beam deposition of high temperature superconducting thin films G. Mladenov, et al. Deposition of nanoscale multilayered structures using filtered cathodic vacuum arc plasma beams M.M.M. Bilek, et al. Implantation of steel by MEVVA ion source with bronze cathode Z. Werner, et al. Resistance to high temperature oxidation of Si-implanted TiN coatings on steel Z. Werner, et al. Vacuum arc deposited DLC-based coatings O.R. Monteiro, M.P. Delplanke-Ogletree. Applications of vacuum arc plasma to neuroscience I.G. Brown, et al Concerning regularities of particle motion in potential fields V.I. Fedulov. High current plasma lens: status and new developments A.A. Goncharov. Subject Index.

Vacuum arc ion source with filtered plasma for macroparticle‐free implantation

An inherent feature of the vacuum arc discharge is that small droplets of micrometer size (macroparticles) are produced along with the plasma in the cathode spots. Droplet contamination of the substrate can occur when implanting metal ions using a vacuum arc ion source. The contamination can be significant for some cathode materials such as lead and other low melting point metals, which for some ion implantation applications such as for semiconductor doping and metallic corrosion inhibition can be a detriment. We have developed a vacuum arc ion source in which the plasma is filtered before the ions are extracted. By guiding the arc‐produced plasma through a 60° bent magnetic duct, macroparticles are completely removed from the plasma. No additional power supply for the guiding magnetic field is required since the pulsed arc current itself is used to drive the magnetic solenoid. Tests have shown that macroparticle‐free metal ion implantation can be done while maintaining the high ion beam current typical o...

Ion beam profile monitor

We describe a simple and inexpensive diagnostic for rapid measurement and display of the radial profile of the ion beam generated by an experimental ion source. The technique may be useful for other kinds of beams also.

High-energy metal ion implantation for reduction of surface resistivity of alumina ceramic

In this work, the possibility to increase the surface conductivity of ceramic insulators through their treatment with accelerated metal ion beams produced by a MevvaV.Ru vacuum arc source is demonstrated. The increase in surface conductivity is made possible due to experimental conditions in which an insulated collector is charged by beam ions to a potential many times lower than the accelerating voltage, and hence, than the average beam ion energy. The observed effect of charge neutralization of the accelerated ion beam is presumably associated with electrons knocked out of the electrodes of the accelerating system of the source and of the walls of the vacuum chamber by the accelerated ions.

Inexpensive computer data‐acquisition system

A system based on an Apple II+ personal computer is used for on‐line monitoring of ion‐beam characteristics in accelerator ion source development.

Generation of Multiply Charged Ions in the Plasma of a Vacuum Arc Discharge

This paper presents the results of a study on the generation of multiply charged ions in the plasma of a vacuum arc discharge. The average charge of ions in the plasma is increased by using a strong magnetic field, a current “burst,” or an accelerated electron beam. The results of measurements of the ion charge distribution for each case are reported.

Vacuum arc ion sources with gaseous plasma trigger systems

Triggering systems for vacuum arc plasma sources and ion sources have been developed that make use of a gaseous trigger discharge in a strong magnetic field. Two kinds of trigger discharge configurations have been explored, a Penning discharge and a magnetron discharge. The approach works reliably for low gas pressure in the vacuum arc environment and for long periods of operation between required maintenance: pressures in the mid 10/sup -6/ Torr range and for /spl sim/10/sup 6/ pulses.