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Featured researches published by Ikuo Hikima.


Applied Optics | 1992

Spatial coherence of KrF excimer lasers

Shintaro Kawata; Ikuo Hikima; Yutaka Ichihara; Shuntaro Watanabe

The spatial coherence and the beam divergence at 248 nm of a KrF excimer laser were obtained experimentally. These results are in good agreement with the theoretical calculations based on a simple pulse-laser model and the van Cittert-Zernike theorem. The relation between the spatial coherence and the beam divergence was obtained theoretically and supported by experimental results. This expression is given as a function of the wavelength of the laser but includes no parameters related to the laser structure. It is shown that these theoretical results are applicable to various kinds of pulse laser.


Optical Microlithography and Metrology for Microcircuit Fabrication | 1989

Illumination System Of An Excimer Laser Stepper

Yutaka Ichihara; Shintaro Kawata; Ikuo Hikima; Masato Hamatani; Yuuji Kudoh; Akikazu Tanimoto

An illumination system suitable for an excimer laser stepper has been investigated. Unnecessary interference pattern(speckel) is reduced effectively by scanning the laser beam. We report spatial coherence of the lasers with different spectral line width, illumination system of the stepper, appearance of the interference pattern,its spacing and contrust and their relation to the illumination system and to the coherence of the laser. Then we report reduction of this pattern together with a simple method to measure its contrast.


Archive | 1988

Laser beam working system

Ikuo Hikima; Akira Miyaji; Saburo Kamiya; Akikazu Tanimoto


Archive | 2006

Exposing device and exposing method, and device manufacturing method

Ikuo Hikima; Hisanori Kita; Yasushi Mizuno; Hisashi Nishinaga; Osamu Tanitsu; Mitsunori Toyoda; 尚憲 北; 郁雄 引間; 恭志 水野; 壽 西永; 修 谷津; 光紀 豊田


Archive | 1990

Exposure apparatus using excimer laser source

Ikuo Hikima


Archive | 2006

Measurement apparatus, exposure apparatus, and device manufacturing method

Ikuo Hikima


Archive | 2010

Exposure apparatus, method for exposure, and method for manufacturing device

Ikuo Hikima; Hisanori Kita; Yasushi Mizuno; Hisashi Nishinaga; Osamu Tanitsu; Mitsunori Toyoda; 尚憲 北; 郁雄 引間; 恭志 水野; 壽 西永; 修 谷津; 光紀 豊田


Archive | 2006

Flare measuring method and flare measuring apparatus, exposure method and exposure apparatus, and exposure apparatus adjusting method

Ikuo Hikima


Archive | 2015

露光装置、計測方法、露光方法、及びデバイス製造方法

壽 西永; Hisashi Nishinaga; 郁雄 引間; Ikuo Hikima; 豊田 光紀; Mitsunori Toyoda; 光紀 豊田; 水野 恭志; Yasushi Mizuno; 恭志 水野; 尚憲 北; Hisanori Kita; 谷津 修; Osamu Tanitsu; 修 谷津


Archive | 2004

Appareil d'exposition, procede d'exposition, et procede de fabrication du dispositif

Hisashi Nishinaga; Ikuo Hikima; Mitsunori Toyoda; Masahiro Nakagawa; Tsuneyuki Hagiwara; Yasushi Mizuno; Naonori Kita; Osamu Tanitsu; Nozomu Emura

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