Osamu Tanitsu
Nikon
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Publication
Featured researches published by Osamu Tanitsu.
Optical Microlithography XVIII | 2005
Hisashi Nishinaga; Noriaki Tokuda; Soichi Owa; Shigeru Hirukawa; Osamu Tanitsu; Takehito Kudo; Hirohisa Tanaka
Nikon has developed an illuminator with special options for RET (Resolution Enhancement Technique). For one of the solutions of RET, Nikon has pursued the development of a loss-less polarized illumination system. When the polarization direction is the same as the direction of the printed pattern, this technique improves image contrast and extends the process margin. We have simulated the impact of the RET with polarized illumination, in the case of dipole illumination and phase-shift masks, and we have estimated the dominant parameters for high performance polarized illumination. In addition, we have constructed a polarized-light illuminator and installed it in an ArF full-field scanner. We have measured and optimized the degree and distribution of polarization at the wafer plane with a special tool, and we have investigated image performance with polarized dipole illumination. Results show that the new polarized-light illuminator has extended the process margin, especially with respect to dose latitude. The results of the image simulations and experiments will be reported.
Proceedings of SPIE | 2010
Tomoyuki Matsuyama; Naonori Kita; Toshiharu Nakashima; Osamu Tanitsu; Soichi Owa
Due to the extremely small process window in the 32nm feature generation and beyond, it is necessary to implement active techniques that can expand the process window and robustness of the imaging against various kinds of imaging parameters. Source & Mask Optimization (SMO) 1 is a promising candidate for such techniques. Although many applications of SMO are expected, tolerancing and specifications for aggressively customized illuminators have not been discussed yet. In this paper we are going to study tolerancing of a freeform pupilgram which is a solution of SMO. We propose Zernike intensity/distortion modulation method to express pupilgram errors. This method may be effective for tolerancing analysis and defining the specifications for freeform illumination. Furthermore, this method is can be applied to OPE matching of free form illumination source.
Proceedings of SPIE | 2010
Yasushi Mizuno; Tomoyuki Matsuyama; Soichi Owa; Osamu Tanitsu; Naonori Kita; Masahiko Okumura
Source Mask Optimization (SMO) 1 is proposed and being developed for the 32 nm generation and beyond in order to extend dose / focus margin by simultaneous optimization of the illuminator source shape and a customized mask. For several years now, mask optimization techniques have been improving. At the same time, the flexibility of the illuminator must also be improved, leading to more complex illumination shapes. As a result, pupil fill is moving from a parametric model defined by sigma value, ratio, clocking angle, subtended angle and/or, pole balance, to a freeform condition with gray scale defined by light intensity in the illuminator. We have evaluated an intelligent illuminator in order to meet requirements of SMO. Then we have confirmed controllability of the pupilgram.
Japanese Journal of Applied Physics | 1995
Kazuaki Suzuki; Ken Ozawa; Osamu Tanitsu; Masato Go
Techniques of dosage control for scanning exposure are introduced and the accuracy of exposure dose achieved by these techniques are discussed. Analytical formulation of the dosage accuracy is performed for the first time under consideration of both pulsed energy fluctuation and exposed position jitter. Actual dosage accuracy was measured by adopting the simplest method. Experimental data from the exposure apparatus are shown and the effectiveness of derived formula for dosage error estimation is confirmed. Application for the exposure system is also discussed.
advanced semiconductor manufacturing conference | 2006
Tomoyuki Matsuyama; Hisashi Nishinaga; Noriaki Tokuda; Shigeru Hirukawa; Osamu Tanitsu; Soichi Owa
Polarized light illumination is essential for hyper-NA imaging such as immersion lithography. This is confirmed by comparison of optical images between unpolarized light illumination condition and polarized light illumination condition. In this paper, we introduce our polarized light illumination apparatus and some experimental results, which confirm the effect of improvement of the imaging performance by utilization of polarized light illumination. In addition, required quality of the polarized light illumination for hyper NA lithography is discussed
Archive | 2006
Osamu Tanitsu; Hiroyuki Hirota; Koji Shigematsu; Shinichi Kurita
Archive | 2004
Kenichi Muramatsu; Norio Komine; Osamu Tanitsu; Hirohisa Tanaka
Archive | 2003
Hideki Komatsuda; Osamu Tanitsu; Akihiko Goto; Nobumichi Kanayamaya; Masato Shibuya; Tetsuo Takahashi
Archive | 2010
Osamu Tanitsu; Hirohisa Tanaka; Kenichi Muramatsu; Norio Komine; Hisashi Nishinaga; Tomoyuki Matsuyama; Takehito Kudo
Archive | 2003
Hirohisa Tanaka; Osamu Tanitsu; Mitsunori Toyoda