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Ishikawa Tetsuya

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Publication

Featured researches published by Ishikawa Tetsuya.

Archive | 1998

WAFER SUPPORT HAVING PRESSURE ZONE WHERE TEMPERATURE FEEDBACK AND CONTACT AREA ARE SMALL

Lue Brian; Ishikawa Tetsuya; Redeker Fred C; Wong Manus; Li Shijian

Archive | 1998

DEPOSITING CHAMBER AND METHOD FOR FILM WITH LOW DIELECTRIC CONSTANT

Li Shijian; Wang Yaxin; Redeker Fred; Ishikawa Tetsuya; Collins Alan W

Archive | 2001

SILICATE GLASS LOADED WITH STABLE FLUORINE AND DISTRIBUTION OF IMPROVED PROCESSING GAS USED FOR FORMING OTHER FILM

Wang Yaxin; Chan Diana; Sahin Turgut; Ishikawa Tetsuya; Moghadam Farhad

Archive | 2000

Gas distribution process for forming stable fluorine-doped silicate glass and other films

Chan Diana; Ishikawa Tetsuya; Moghadam Farhad; Sahin Turgut; Wang Yaxin

Archive | 1997

Induktiv gekoppelter HDP-CVD-Reaktor

Redeker Fred C; Farhad Moghadam; Hanawa Hiroji; Ishikawa Tetsuya; Maydan Dan; Li Shijian; Lue Brian; Steger Robert; Wang Yaxim; Wong Manus; Sinha Ashok; Nowak Fred Romuald; Niazi Kaveh; Smyth Kenneth; Staryuik Pavel; Krishhanaraj Padmanabham; Murugesh Laxman; Rossman Kent

Archive | 2008

PROCESS KIT, WAFER PROCESSING DEVICE, AND METHOD FOR HEATING PROCESS KIT

Redeker Fred C; Farhad Moghadam; Hanawa Hiroji; Ishikawa Tetsuya; Maydan Dan; Li Shijian; Brian Ryu; Steger Robert; Wang Yaxim; Wong Manus; Sinha Ashok; Nowak Fred Romuald; Niazi Kaveh; Kenneth Smith; Staryuik Pavel; Krishhanaraj Padmanabham; Murugesh Laxman; Rossman Kent

Archive | 2008

Chemisches Gasphasenabscheidungsverfahren zur Herstellung von dielektrischem Material

Wang Yaxin; Chan Diana; Sahin Turgut; Ishikawa Tetsuya; Moghadam Farhad

Archive | 2002

AUFDAMPFUNGSKAMMER UND VERFAHREN ZUR HERSTELLUNG EINES FILMS MIT EINER NIEDRIGEN DIELEKTRIZITÄTSKONSTANTE

Li Shijian; Wang Yaxin; Redeker Fred C; Ishikawa Tetsuya; Collins Alan W

Archive | 2001

CVD PROCESS CHAMBER GAS DISTRIBUTION SYSTEM

Ishikawa Tetsuya; Krishnaraj Padmanabhan; Gao Feng; Collins Alan W; Pang Lily L

Archive | 2001

METHOD OF HIGH DENSITY PLASMA CHEMICAL VAPOR DEPOSITION OF FILMS ONTO SUBSTRATES IN DEPOSITION CHAMBER

Collins Alan W; Gao Feng; Ishikawa Tetsuya; Krishnaraj Padmanabhan; Pang Lily L

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Li Shijian

Applied Materials

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Redeker Fred C

Applied Materials

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Maydan Dan

Applied Materials

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Nowak Fred Romuald

Applied Materials

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