J. Laube

Charge transport in Si nanocrystal/SiO2 superlattices

Size-controlled silicon nanocrystals in silicon oxynitride matrix were prepared using plasma-enhanced chemical vapor deposition following the superlattice approach. A combination of current transport and charge trapping studies is carried out on a number of samples with varied structural configuration. We demonstrate that at low electric fields, trapping of injected carriers dominates, if the coupling between the silicon nanocrystals is strong. In contrast, we show that at higher electric fields, the charge distribution within the films is essentially governed by charge separation within the superlattice. This effect can be well explained by a two-step electric field ionization of silicon nanocrystals that proceeds via defect-assisted band-to-band tunneling of silicon valence electrons to the conduction band and is mediated by silicon surface dangling bonds. The defects are dominating the charge transport even if the defect density is reduced to a minimum by efficient hydrogen passivation.

Electronic properties of phosphorus doped silicon nanocrystals embedded in SiO2

We study the electronic properties of phosphorus doped Si nanocrystal/SiO2 superlattices and determine the carrier concentration by transient current analysis. This is achieved by encapsulating the multilayers between two electrical insulation layers and controlling the carrier mobility by a defined layer to layer separation. A saturation of the voltage dependent ionized carrier density is observed which indicates complete substitutional dopant ionization and allows to calculate the dopant induced charge carrier density. It is found that the doping efficiency of the superlattice is only 0.12% considering the full ionization regime which explains the unusual small dopant effect on transport characteristics.

Charge transport and electroluminescence of silicon nanocrystals/SiO2 superlattices

Charge transport and electroluminescence mechanisms in Si-rich Si oxynitride/silicon oxide (SRON/SiO2) superlattices deposited on p-type Si substrate are reported. The superlattice structures were deposited by plasma-enhanced chemical-vapor deposition and subsequently annealed at 1150 °C to precipitate and crystallize the Si excess into Si nanocrystals. The dependence of the electrical conduction on the applied voltage and temperature was found to be well described by a Poole-Frenkel transport mechanism over a wide voltage range. On the other hand, the observed dependence of the electroluminescence on the SRON layer thickness is a clear proof of quantum confinement and was attributed to an excitonic radiative recombination taking place in the confined states within the Si quantum dots. A model is proposed based on thermal hopping of electrons between the quantum dots acting as trap states (Poole-Frenkel). A correlation between carrier transport and electroluminescence has been established considering impa...

Formation of size controlled silicon nanocrystals in nitrogen free silicon dioxide matrix prepared by plasma enhanced chemical vapor deposition

This paper reports the growth of silicon nanocrystals (SiNCs) from SiH4–O2 plasma chemistry. The formation of an oxynitride was avoided by using O2 instead of the widely used N2O as precursor. X-ray photoelectron spectroscopy is used to prove the absence of nitrogen in the layers and determine the film stoichiometry. It is shown that the Si rich film growth is achieved via non-equilibrium deposition that resembles a interphase clusters mixture model. Photoluminescence and Fourier transformed infrared spectroscopy are used to monitor the formation process of the SiNCs, to reveal that the phase separation is completed at lower temperatures as for SiNCs based on oxynitrides. Additionally, transmission electron microscopy proves that the SiNC sizes are well controllable by superlattice configuration, and as a result, the optical emission band of the Si nanocrystal can be tuned over a wide range.

Observing the morphology of single-layered embedded silicon nanocrystals by using temperature-stable TEM membranes

Summary We use high-temperature-stable silicon nitride membranes to investigate single layers of silicon nanocrystal ensembles by energy filtered transmission electron microscopy. The silicon nanocrystals are prepared from the precipitation of a silicon-rich oxynitride layer sandwiched between two SiO2 diffusion barriers and subjected to a high-temperature annealing. We find that such single layers are very sensitive to the annealing parameters and may lead to a significant loss of excess silicon. In addition, these ultrathin layers suffer from significant electron beam damage that needs to be minimized in order to image the pristine sample morphology. Finally we demonstrate how the silicon nanocrystal size distribution develops from a broad to a narrow log-normal distribution, when the initial precipitation layer thickness and stoichiometry are below a critical value.

Deposition temperature dependence and long-term stability of the conductivity of undoped ZnO grown by atomic layer deposition

Understanding the stability and deposition parameter dependence of intrinsically conductive undoped ZnO prepared by thermal atomic layer deposition is mandatory for future applications. The authors investigate the conductivity of ZnO films deposited at temperatures between 100 and 200 °C as well as its evolution over a period of 160 days under different storing conditions. Most importantly, the conductivity increases by about 1 order of magnitude when the deposition temperature is increased from 100 to 150 °C. Highest conductivities of up to 170 S/cm are reached for ≥175 °C, and these samples do not show any aging effects of the conductivity under ambient storing conditions. In contrast, for deposition temperatures ≤150 °C, accelerated aging led to a significant decrease in conductivity. The best trade-off between the low deposition temperature and good long-term stable conductivity is found to be at 175 °C. A correlation between the intensity of the well-known defect photoluminescence peak (∼1.9 eV) and ...

Modulation of the electroluminescence emission from ZnO/Si NCs/p-Si light-emitting devices via pulsed excitation

In this work, the electroluminescence (EL) emission of zinc oxide (ZnO)/Si nanocrystals (NCs)-based light-emitting devices was studied under pulsed electrical excitation. Both Si NCs and deep-level ZnO defects were found to contribute to the observed EL. Symmetric square voltage pulses (50-μs period) were found to notably enhance EL emission by about one order of magnitude. In addition, the control of the pulse parameters (accumulation and inversion times) was found to modify the emission lineshape, long inversion times (i.e., short accumulation times) suppressing ZnO defects contribution. The EL results were discussed in terms of the recombination dynamics taking place within the ZnO/Si NCs heterostructure, suggesting the excitation mechanism of the luminescent centers via a combination of electron impact, bipolar injection, and sequential carrier injection within their respective conduction regimes.

Interplay of bimolecular and Auger recombination in photoexcited carrier dynamics in silicon nanocrystal/silicon dioxide superlattices

We report results of investigating carrier recombination in silicon nanocrystal/silicon dioxide superlattices. The superlattices prepared by nitrogen-free plasma enhanced chemical vapour deposition contained layers of silicon nanocrystals. Femtosecond transient transmission optical spectroscopy was used to monitor carrier mechanisms in the samples. The three-particle Auger recombination was observed in accord with previous reports. However, under high pump intensities (high photoexcited carrier densities) the bimolecular process dominated the recombination. Detailed analysis of measured data and fitting procedure made it possible to follow and quantify the interplay between the two recombination processes. The bimolecular recombination was interpreted in terms of the trap-assisted Auger recombination.