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Dive into the research topics where J. M. Baranowski is active.

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Featured researches published by J. M. Baranowski.


Nano Letters | 2011

Graphene Epitaxy by Chemical Vapor Deposition on SiC

W. Strupiński; K. Grodecki; A. Wysmołek; R. Stępniewski; Thomas Szkopek; Peter Gaskell; A. Grüneis; D. Haberer; R. Bożek; Jerzy Krupka; J. M. Baranowski

We demonstrate the growth of high quality graphene layers by chemical vapor deposition (CVD) on insulating and conductive SiC substrates. This method provides key advantages over the well-developed epitaxial graphene growth by Si sublimation that has been known for decades. (1) CVD growth is much less sensitive to SiC surface defects resulting in high electron mobilities of ∼1800 cm(2)/(V s) and enables the controlled synthesis of a determined number of graphene layers with a defined doping level. The high quality of graphene is evidenced by a unique combination of angle-resolved photoemission spectroscopy, Raman spectroscopy, transport measurements, scanning tunneling microscopy and ellipsometry. Our measurements indicate that CVD grown graphene is under less compressive strain than its epitaxial counterpart and confirms the existence of an electronic energy band gap. These features are essential for future applications of graphene electronics based on wafer scale graphene growth.


Physical Review B | 2010

Quasiclassical cyclotron resonance of Dirac fermions in highly doped graphene

A. M. Witowski; M. Orlita; R. Stępniewski; A. Wysmołek; J. M. Baranowski; W. Strupiński; C. Faugeras; G. Martinez; M. Potemski

Cyclotron resonance in highly doped graphene has been explored in the infrared magneto-transmission experiment. Contrary to previous works, which only focused on the magneto-optical properties of graphene in its quantum regime, here we study the quasi-classical response of this system. We show that it has a character of classical cyclotron resonance, which is linear in the applied magnetic field, with an effective cyclotron mass defined by the position of the Fermi level m = E_F/v_F^2.


Journal of Applied Physics | 2010

Transmission electron microscopy investigations of epitaxial graphene on C-terminated 4H–SiC

J. Borysiuk; R. Bożek; K. Grodecki; A. Wysmołek; W. Strupiński; R. Stępniewski; J. M. Baranowski

Transmission electron microscopy (TEM) investigations of epitaxial graphene, grown on on-axis and 8° off-axis C-terminated 4H–SiC (0001¯) surfaces are presented. The TEM results provide evidence that the first carbon layer is separated by 3.2 A from the C-terminated SiC surface. It was also found that thick graphene layers grown on on-axis SiC (0001¯) are loosely bound to the SiC substrate. Moreover, the structural observations reveal a certain degree of disorder between the graphene planes, which manifests itself in a rotation of the layers and in an increase in the interplanar spacing between certain carbon layers from 3.35 A, which is characteristic for graphite, up to 3.7 A. Graphene grown on 8° off-axis SiC (0001¯) substrates covers the steps of SiC and as a result disorder seems to be not as pronounced as it is on the on-axis SiC (0001¯) substrate.


Physical Review B | 2011

Magneto-optics of bilayer inclusions in multilayered epitaxial graphene on the carbon face of SiC

M. Orlita; C. Faugeras; Jolanta Borysiuk; J. M. Baranowski; W. Strupiński; M. Sprinkle; Claire Berger; W. A. de Heer; D. M. Basko; G. Martinez; M. Potemski

M. Orlita, 2, ∗ C. Faugeras, J. Borysiuk, J. M. Baranowski, W. Strupiński, M. Sprinkle, C. Berger, 7 W. A. de Heer, D. M. Basko, G. Martinez, and M. Potemski Laboratoire National des Champs Magnétiques Intenses, CNRS-UJF-UPS-INSA, 25, avenue des Martyrs, 38042 Grenoble, France Institute of Physics, Faculty of Mathematics and Physics, Charles University, Ke Karlovu 5, 121 16 Praha 2, Czech Republic Institute of Physics, Polish Academy of Sciences, 02-668 Warsaw, Al. Lotnikow 32/46, Poland Institute of Experimental Physics, University of Warsaw, Hoża 69, PL 00-681 Warsaw, Poland Institute of Electronic Materials Technology, PL 01-919 Warsaw, Poland School of Physics, Georgia Institute of Technology, Atlanta, Georgia 30332, USA Institut Néel/CNRS-UJF BP 166, F-38042 Grenoble Cedex 9, France Laboratoire de Physique et Modélisation des Milieux Condensés, UJF and CNRS, F-38042 Grenoble, France (Dated: January 25, 2011)


Applied Physics Letters | 2012

Micro-Raman spectroscopy of graphene grown on stepped 4H-SiC (0001) surface

K. Grodecki; R. Bożek; W. Strupiński; A. Wysmołek; R. Stępniewski; J. M. Baranowski

Graphene grown by chemical vapor deposition on 4H-SiC (0001) was studied using micro-Raman spectroscopy and atomic force microscopy (AFM). AFM revealed that the graphene structure grown on on-axis substrates has a stepped morphology. This is due to step bunching, which results from etching in hydrogen as well as from the process of graphene formation itself. It was shown by micro-Raman spectroscopy that the properties of graphene present on step edges and on terraces are quite different. Graphene on terraces is uniform with a relatively small thickness and strain fluctuations. On the other hand, graphene on step edges has a large thickness and strain variations occur. A careful analysis of micro-Raman spatial maps led us to the conclusion that the carrier concentration on step edge regions is lowered when compared with terrace regions.


Applied Physics Letters | 2013

Structural investigations of hydrogenated epitaxial graphene grown on 4H-SiC (0001)

Mateusz Tokarczyk; G. Kowalski; M. Możdżonek; Jolanta Borysiuk; R. Stępniewski; W. Strupiński; P. Ciepielewski; J. M. Baranowski

Structural investigations of hydrogenated epitaxial graphene grown on SiC(0001) are presented. It is shown that hydrogen plays a dual role. In addition to contributing to the well-known removal of the buffer layer, it goes between the graphene planes, resulting in an increase of the interlayer spacing to 3.6u2009A–3.8u2009A. It is explained by the intercalation of molecular hydrogen between carbon planes, which is followed by H2 dissociation, resulting in negatively charged hydrogen atoms trapped between the graphene layers, with some addition of covalent bonding to carbon atoms. Negatively charged hydrogen may be responsible for p-doping observed in hydrogenated multilayer graphene.


Materials Science Forum | 2009

Growth of Graphene Layers on Silicon Carbide

Wlodek Strupinski; R. Bożek; Jolanta Borysiuk; Kinga Kościewicz; A. Wysmołek; R. Stępniewski; J. M. Baranowski

The so-called “growth” of graphene was performed using a horizontal chemical vapor deposition (CVD) hot-wall reactor. In-situ etching in the mixture (H2-C3H8) was performed prior to growth at 1600oC temperature under 100 mbar. Systematic studies of the influence of the decomposition temperature and time, substrates roughness, etching of the substrates, heating rate, SiC dezorientation and other process parameters on the graphene thickness and quality have been conducted. Morphology and atomic scale structure of graphene was examined by Scanning Tunnelling Microscopy (STM), Transmission Electron Microscopy (TEM) and Raman scattering methods.


Journal of Applied Physics | 2012

Pinned and unpinned epitaxial graphene layers on SiC studied by Raman spectroscopy

K. Grodecki; J. A. Blaszczyk; W. Strupiński; A. Wysmołek; R. Stępniewski; Aneta Drabińska; M. Sochacki; A. Dominiak; J. M. Baranowski

The study of epitaxial graphene layers grown on SiC by two techniques, namely, the traditional Si sublimation method and the recent chemical vapor deposition (CVD) using temperature induced shift of the Raman 2D line, is presented. The measurements of thermal shift rate of 2D line on 4u2009H-SiC(0001) allowed us to determine notable differences in interaction of graphene with SiC substrate. The obtained results show that graphene layers grown by Si sublimation of 4u2009H-SiC(0001) are pinned strongly to the substrate. In contrast, the layers of graphene grown on 4u2009H-SiC(0001) substrates by CVD showed much weaker pinning. It was found that the film consisting of two or three graphene layers grown by CVD was already unpinned and thus showing Raman shift expected for freestanding graphene. The obtained differences in pinning of epitaxial graphene layers are explained in terms of basic growth mechanism differences between these two methods: graphene growth by Si sublimation is a “bottom-up” process and by CVD—a “top-...


Materials Science Forum | 2010

Growth Rate and Thickness Uniformity of Epitaxial Graphene

Wlodek Strupinski; Aneta Drabińska; R. Bożek; Jolanta Borysiuk; A. Wysmołek; R. Stępniewski; Kinga Kościewicz; Piotr Caban; K.P. Korona; K. Grodecki; Pierre Antoine Geslin; J. M. Baranowski

The paper provides a deeper understanding of key-parameters of epitaxial graphene growth techniques on SiC. At 16000C, the graphene layer is continuous and covers a large area of the substrate. Significant differences in the growth rate could be observed for different reactor pressures and the polarity of SiC substrates as well as for the substrate miscut and surface quality. In addition, graphene thickness uniformity and mechanism of ridges creation was examined.


Materials Science Forum | 2010

Optical Transmission of Epitaxial Graphene Layers on SiC in the Visible Spectral Range

Aneta Drabińska; Jolanta Borysiuk; Wlodek Strupinski; J. M. Baranowski

Optical transmission and transmission electron microscopy studies of epitaxial graphene structures grown on the carbon terminated face of 4H-SiC(000-1) on-axis substrates are presented. Several samples obtained using different growth conditions were studied. Optical microscope showed regions of micrometer size with different layer number. The exact number of layers was obtained from transmission electron microscope studies. Optical transmission spectra showed no wavelength dependence and allowed us to obtain the average number of graphene layers.

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Wlodek Strupinski

Warsaw University of Technology

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M. Potemski

Centre national de la recherche scientifique

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