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Jens Kramer

Advanced Micro Devices

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Publication

Featured researches published by Jens Kramer.

Archive | 2004

Method and system for controlling the chemical mechanical polishing by using a sensor signal of a pad conditioner

Jens Kramer; Uwe Gunter Stoeckgen; Jens Kunath

Archive | 2004

Method and system for controlling the chemical mechanical polishing by using a seismic signal of a seismic sensor

Jens Kramer; Thomas Gyulai; Arwed Reichel

Archive | 2003

Retaining ring having reduced wear and contamination rate for a polishing head of a CMP tool

Jens Kramer; Gerd Marxsen; Rene Nitsche

Archive | 2001

Test station for polishing head of chemical-mechanical polishing arrangement has indicator showing status representing reliability of polishing head

Mirko Augustin; Jens Kramer

Archive | 2004

Verfahren und System zum Steuern des chemisch-mechanischen Polierens mittels eines Sensorsignals eines Polierkissenkonditionierers

Jens Kramer; Jens Kunath; Uwe Gunter Stoeckgen

Planarization / CMP Technology (ICPT), 2007 International Conference on | 2011

Full Sequence Ecmp for Advanced Low Stress Copper Planarization

Johannes Groschopf; Katja Steffen; Ray Donohoe; Christian Kober; Dirk Richter; Jens Kramer; Robert Seidel; Michael Grillberger; Haiyang Gu; Yongqi Hu; You Wang; Yuchun Wang

Archive | 2004

Haltering mit reduzierter Abnutzungs- und Kontaminationsrate für einen Polierkopf einer CMP-Anlage

Jens Kramer; Gerd Marxsen; Rene Nitsche

Archive | 2003

A method of operating a chemical mechanical polishing system by means of a sensor signal of a Polierkissenkonditionierers

Jens Kramer; Jens Kunath; Uwe Gunter Stoeckgen

Archive | 2003

Verfahren und System zum Steuern des chemisch-mechanischen Polierens mittels eines seismischen Signals eines seismischen Sensors

Jens Kramer; Thomas Gyulai; Arwed Reichel

Archive | 2003

Verfahren und System zum Steuern des chemisch-mechanischen Polierens unter Anwendung eines Sensorsignals eines Kissenkonditionierers A method and system for controlling the chemical-mechanical polishing using a sensor signal of a pad conditioner

Gerd Marxsen; Jens Kramer; Uwe Gunter Stoeckgen

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Collaboration

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Uwe Gunter Stoeckgen

Advanced Micro Devices

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Gerd Marxsen

Advanced Micro Devices

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Jens Kunath

Advanced Micro Devices

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Rene Nitsche

Advanced Micro Devices

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Arwed Reichel

Advanced Micro Devices

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Thomas Gyulai

Advanced Micro Devices

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Christian Kober

Applied Materials

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Dirk Richter

Advanced Micro Devices

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Haiyang Gu

Applied Materials

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Johannes Groschopf

Advanced Micro Devices

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