Jeongpil Park

Tailoring a two-dimensional electron gas at the LaAlO3/SrTiO3 (001) interface by epitaxial strain

Recently a metallic state was discovered at the interface between insulating oxides, most notably LaAlO3 and SrTiO3. Properties of this two-dimensional electron gas (2DEG) have attracted significant interest due to its potential applications in nanoelectronics. Control over this carrier density and mobility of the 2DEG is essential for applications of these unique systems, and may be achieved by epitaxial strain. However, despite the rich nature of strain effects on oxide materials properties, such as ferroelectricity, magnetism, and superconductivity, the relationship between the strain and electrical properties of the 2DEG at the LaAlO3/SrTiO3 heterointerface remains largely unexplored. Here, we use different lattice constant single-crystal substrates to produce LaAlO3/SrTiO3 interfaces with controlled levels of biaxial epitaxial strain. We have found that tensile-strained SrTiO3 destroys the conducting 2DEG, while compressively strained SrTiO3 retains the 2DEG, but with a carrier concentration reduced in comparison to the unstrained LaAlO3/SrTiO3 interface. We have also found that the critical LaAlO3 overlayer thickness for 2DEG formation increases with SrTiO3 compressive strain. Our first-principles calculations suggest that a strain-induced electric polarization in the SrTiO3 layer is responsible for this behavior. The polarization is directed away from the interface and hence creates a negative polarization charge opposing that of the polar LaAlO3 layer. This behavior both increases the critical thickness of the LaAlO3 layer, and reduces carrier concentration above the critical thickness, in agreement with our experimental results. Our findings suggest that epitaxial strain can be used to tailor 2DEGs properties of the LaAlO3/SrTiO3 heterointerface.

Template engineering of Co-doped BaFe2As2 single-crystal thin films

Understanding new superconductors requires high-quality epitaxial thin films to explore intrinsic electromagnetic properties and evaluate device applications. So far, superconducting properties of ferropnictide thin films seem compromised by imperfect epitaxial growth and poor connectivity of the superconducting phase. Here we report new template engineering using single-crystal intermediate layers of (001) SrTiO(3) and BaTiO(3) grown on various perovskite substrates that enables genuine epitaxial films of Co-doped BaFe(2)As(2) with a high transition temperature (T(c,rho=0) of 21.5 K, where rho=resistivity), a small transition width (DeltaT(c)=1.3 K), a superior critical current density J(c) of 4.5 MA cm(-2) (4.2 K) and strong c-axis flux pinning. Implementing SrTiO(3) or BaTiO(3) templates to match the alkaline-earth layer in the Ba-122 with the alkaline-earth/oxygen layer in the templates opens new avenues for epitaxial growth of ferropnictides on multifunctional single-crystal substrates. Beyond superconductors, it provides a framework for growing heteroepitaxial intermetallic compounds on various substrates by matching interfacial layers between templates and thin-film overlayers.

Creation of a two-dimensional electron gas at an oxide interface on silicon

In recent years, reversible control over metal-insulator transition has been shown, at the nanoscale, in a two-dimensional electron gas (2DEG) formed at the interface between two complex oxides. These materials have thus been suggested as possible platforms for developing ultrahigh-density oxide nanoelectronics. A prerequisite for the development of these new technologies is the integration with existing semiconductor electronics platforms. Here, we demonstrate room-temperature conductivity switching of 2DEG nanowires formed at atomically sharp LaAlO(3)/SrTiO(3) (LAO/STO) heterointerfaces grown directly on (001) Silicon (Si) substrates. The room-temperature electrical transport properties of LAO/STO heterointerfaces on Si are comparable with those formed from a SrTiO(3) bulk single crystal. The ability to form reversible conducting nanostructures directly on Si wafers opens new opportunities to incorporate ultrahigh-density oxide nanoelectronic memory and logic elements into well-established Si-based platforms.

Origin of suppressed polarization in BiFeO3 films

We have studied the origin of suppressed remanent polarization in 4-variant BiFeO3 by correlating microscopic observations of ferroelectric/ferroelastic domain structures and ferroelectric measurements of (001) epitaxial BiFeO3 thin films with 2- and 4-ferroelastic domain variants. Piezoelectric force microscopy revealed that domain wall pinning was the cause of the reduced polarization observed in 4-variant BiFeO3. Using repetitive switching, the unswitched domains were completely switched and the remanent polarization reached a value comparable to 2-variant BiFeO3. These results demonstrate that control of ferroelastic domains in rhombohedral systems is necessary in order to obtain high performance and reliable ferroelectric and magnetoelectric devices.

Quasi-single-crystal (001) SrTiO3 templates on Si

The integration of multifunctional oxides on semiconductor devices requires the formation of single-crystal-like oxide templates directly on silicon. We report the fabrication of quasi-single-crystal (001) SrTiO3 templates on (001) Si by annealing 100 nm thick molecular beam epitaxy-grown epitaxial SrTiO3 films at 900u2009°C. The full width at half maximum of the (002) rocking curve is 0.006°, which is much narrower than SrTiO3 bulk single crystals. An atomically smooth TiO2-terminated surface is obtained by buffered-HF etching, which allows us to create functional oxide heterointerfaces on Si. Epitaxial SrRuO3 thin films grown on the quasi-single-crystal SrTiO3 template exhibit a superior crystalline quality and surface morphology.

Annealing of dilute-nitride GaAsSbN∕InP strained multiple quantum wells

The thermal annealing of GaAsSbN∕InP strained multiple quantum wells (MQWs) grown by metal organic chemical vapor deposition was investigated. Photoluminescence peak intensity and linewidth changes indicate a significant improvement in optical quality of the GaAsSbN∕InP MQWs upon annealing. We find no significant annealing-induced blueshift of the optical transitions, which confirms the theoretical expectation that a change in the nearest-neighbor configuration nitrogen atoms has negligible effect on the band gap of GaAsSbN. The evolution of (400) x-ray diffraction rocking curves with thermal treatment of the samples was consistent with the constituent redistribution in the GaAsSbN QW.

229 nm UV LEDs on aluminum nitride single crystal substrates using p-type silicon for increased hole injection

Ultraviolet (UV) light emission at 229 nm wavelength from diode structures based on AlN/Al0.77Ga0.23N quantum wells and using p-type Si to significantly increase hole injection was reported. Both electrical and optical characteristics were measured. Owing to the large concentration of holes from p-Si and efficient hole injection, no efficiency droop was observed up to a current density of 76 A/cm2 under continuous wave operation and without external thermal management. An optical output power of 160 uW was obtained with corresponding external quantum efficiency of 0.027%. This study demonstrates that by adopting p-type Si nanomembrane contacts as hole injector, practical levels of hole injection can be realized in UV light-emitting diodes with very high Al composition AlGaN quantum wells, enabling emission wavelengths and power levels that were previously inaccessible using traditional p-i-n structures with poor hole injection efficiency.AlGaN based 229u2009nm light emitting diodes (LEDs), employing p-type Si to significantly increase hole injection, were fabricated on single crystal bulk aluminum nitride (AlN) substrates. Nitride heterostructures were epitaxially deposited by organometallic vapor phase epitaxy and inherit the low dislocation density of the native substrate. Following epitaxy, a p-Si layer is bonded to the heterostructure. LEDs were characterized both electrically and optically. Owing to the low defect density films, large concentration of holes from p-Si, and efficient hole injection, no efficiency droop was observed up to a current density of 76u2009A/cm2 under continuous wave operation and without external thermal management. An optical output power of 160u2009μW was obtained with the corresponding external quantum efficiency of 0.03%. This study demonstrates that by adopting p-type Si nanomembrane contacts as a hole injector, practical levels of hole injection can be realized in UV light-emitting diodes with very high Al composit...

High-sensitivity silicon ultraviolet p+-i-n avalanche photodiode using ultra-shallow boron gradient doping

Photo detection of ultraviolet (UV) light remains a challenge since the penetration depth of UV light is limited to the nanometer scale. Therefore, the doping profile and electric field in the top nanometer range of the photo detection devices become critical. Traditional UV photodetectors usually use a constant doping profile near the semiconductor surface, resulting in a negligible electric field, which limits the photo-generated carrier collection efficiency of the photodetector. Here, we demonstrate, via the use of an optimized gradient boron doping technique, that the carrier collection efficiency and photo responsivity under the UV wavelength region have been enhanced. Furthermore, the ultrathin p+-i-n junction shows an avalanche gain of 2800 and an ultra-low junction capacitance (sub pico-farad), indicating potential applications in the low timing jitter single photon detection area.

Band-Bending of Ga-Polar GaN Interfaced with Al2O3 through Ultraviolet/Ozone Treatment

Understanding the band bending at the interface of GaN/dielectric under different surface treatment conditions is critically important for device design, device performance, and device reliability. The effects of ultraviolet/ozone (UV/O3) treatment of the GaN surface on the energy band bending of atomic-layer-deposition (ALD) Al2O3 coated Ga-polar GaN were studied. The UV/O3 treatment and post-ALD anneal can be used to effectively vary the band bending, the valence band offset, conduction band offset, and the interface dipole at the Al2O3/GaN interfaces. The UV/O3 treatment increases the surface energy of the Ga-polar GaN, improves the uniformity of Al2O3 deposition, and changes the amount of trapped charges in the ALD layer. The positively charged surface states formed by the UV/O3 treatment-induced surface factors externally screen the effect of polarization charges in the GaN, in effect, determining the eventual energy band bending at the Al2O3/GaN interfaces. An optimal UV/O3 treatment condition also exists for realizing the best interface conditions. The study of UV/O3 treatment effect on the band alignments at the dielectric/III-nitride interfaces will be valuable for applications of transistors, light-emitting diodes, and photovoltaics.

226 nm AlGaN/AlN UV LEDs using p-type Si for hole injection and UV reflection

Deep ultraviolet (UV) light-emitting diodes (LEDs) at a wavelength of 226u2009nm based on AlGaN/AlN multiple quantum wells using p-type Si as both the hole supplier and the reflective layer are demonstrated. In addition to the description of the hole transport mechanism that allows hole injection from p-type Si into the wide bandgap device, the details of the LED structure which take advantage of the p-type Si layer as a reflective layer to enhance light extraction efficiency (LEE) are elaborated. Fabricated LEDs were characterized both electrically and optically. Owing to the efficient hole injection and enhanced LEE using the p-type Si nanomembranes (NMs), an optical output power of 225u2009μW was observed at 20u2009mA continuous current operation (equivalent current density of 15u2009A/cm2) without external thermal management. The corresponding external quantum efficiency is 0.2%, higher than any UV LEDs with emission wavelength below 230u2009nm in the continuous current drive mode. The study demonstrates that adopting p-type Si NMs as both the hole injector and the reflective mirror can enable high-performance UV LEDs with emission wavelengths, output power levels, and efficiencies that were previously inaccessible using conventional p-i-n structures.Deep ultraviolet (UV) light-emitting diodes (LEDs) at a wavelength of 226u2009nm based on AlGaN/AlN multiple quantum wells using p-type Si as both the hole supplier and the reflective layer are demonstrated. In addition to the description of the hole transport mechanism that allows hole injection from p-type Si into the wide bandgap device, the details of the LED structure which take advantage of the p-type Si layer as a reflective layer to enhance light extraction efficiency (LEE) are elaborated. Fabricated LEDs were characterized both electrically and optically. Owing to the efficient hole injection and enhanced LEE using the p-type Si nanomembranes (NMs), an optical output power of 225u2009μW was observed at 20u2009mA continuous current operation (equivalent current density of 15u2009A/cm2) without external thermal management. The corresponding external quantum efficiency is 0.2%, higher than any UV LEDs with emission wavelength below 230u2009nm in the continuous current drive mode. The study demonstrates that adopting p-...