Jinyuan Chen

Multi-station decoupled reactive ion etch chamber

High frequency power supply device and high frequency power supplying method

Multiple frequency plasma chamber, switchable rf system, and processes using same

Decoupling reactive ion etching chamber containing multiple processing platforms

Multi-station plasma reactor with multiple plasma regions

Capacitive cvd reactor and methods for plasma cvd process

Rf power source system, and plasma chamber using the rf power source system

Plasma confinement device and plasma treatment device utilizing the same

PLASMA CHAMBER HAVING SWITCHABLE BIAS POWER AND A SWITCHABLE FREQUENCY RF MATCH NETWORK THEREFOR

Plasma reaction chamber with plurality of plasma reaction zones including plurality of treatment platforms