Tuqiang Ni

Multi-station decoupled reactive ion etch chamber

Multiple frequency plasma chamber, switchable rf system, and processes using same

Decoupling reactive ion etching chamber containing multiple processing platforms

Multi-station plasma reactor with multiple plasma regions

Capacitive cvd reactor and methods for plasma cvd process

Capacitively coupled plasma processing reactor

Rf power source system, and plasma chamber using the rf power source system

Plasma reaction chamber with plurality of plasma reaction zones including plurality of treatment platforms

Processing device with plasma

Radio frequency power source system and plasma reaction chamber applying same