Joachim Keyser
IBM
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Publication
Featured researches published by Joachim Keyser.
Microelectronic Engineering | 1989
Harald Bohlen; W. Haug; M. Kallmeyer; Joachim Keyser; Werner Dr. Kulcke; K. Meissner; Werner Zapka
Abstract Electron Beam Proximity Printing has been reported on several years ago. Meanwhile an experimental tool was built in IBM Sindelfingen. This paper presents some technical details, the resulting tool capabilities and some results achieved so far.
Microelectronic Engineering | 1990
Joachim Keyser; Werner Dr. Kulcke
Abstract Member masks as used for Electron Beam Proximity Printing (EBP) or XR lithography are subject to internal stress. This stress, acting on the non-uniform elasticity of the patterned membrane, cause a distribution of the pattern which is to be printed to the water. This paper deals with pattern distortions in stencil masks for EBP. Factors influencing the distortions are the internal stress, the ration of the width of the upperforted border to the size of the mask, the perforation density and the way of pattern split. The paper shows that the capability of EBP to correct systematic pattern placement errors exceeds the stress induced pattern distortions considerably.
Archive | 1990
Karl Asch; Joachim Keyser; Klaus Meissner; Werner Zapka
Archive | 1987
Werner Zapka; Jurgen Kempf; Joachim Keyser; Karl Asch
Ibm Journal of Research and Development | 1982
Harald Bohlen; Johann Greschner; Joachim Keyser; Werner Dr. Kulcke; Peter Nehmiz
Archive | 1982
Harald Bohlen; Gerhard Kaus; Johann Greschner; Joachim Keyser; Werner Kulcke
Archive | 1986
Karl Asch; Jurgen Kempf; Joachim Keyser; Werner Zapka
Archive | 1987
Harald Bohlen; Johann Greschner; Gerhard Kaus; Joachim Keyser; Werner Dr. Kulcke
Archive | 1986
Karl Asch; Juergen Dr Kempf; Joachim Keyser; Werner Zapka
Archive | 1986
Karl Asch; Juergen Dr Kempf; Joachim Keyser; Werner Zapka
