Werner Dr. Kulcke

Electron beam proximity printing

Abstract Electron Beam Proximity Printing has been reported on several years ago. Meanwhile an experimental tool was built in IBM Sindelfingen. This paper presents some technical details, the resulting tool capabilities and some results achieved so far.

Pattern distortions in EBP stencil masks

Abstract Member masks as used for Electron Beam Proximity Printing (EBP) or XR lithography are subject to internal stress. This stress, acting on the non-uniform elasticity of the patterned membrane, cause a distribution of the pattern which is to be printed to the water. This paper deals with pattern distortions in stencil masks for EBP. Factors influencing the distortions are the internal stress, the ration of the width of the upperforted border to the size of the mask, the perforation density and the way of pattern split. The paper shows that the capability of EBP to correct systematic pattern placement errors exceeds the stress induced pattern distortions considerably.