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Dive into the research topics where John W. Gregory is active.

Publication


Featured researches published by John W. Gregory.


Archive | 1996

Subsonic to supersonic and ultrasonic conditioning of a polishing pad in a chemical mechanical polishing apparatus

Derryl D. J. Allman; John W. Gregory


Archive | 1996

Integrated circuit device having a capacitor with the dielectric peripheral region being greater than the dielectric central region

John J. Seliskar; Derryl D. J. Allman; John W. Gregory; James P. Yakura; Dim Lee Kwong


Archive | 2000

Metal-insulator-metal capacitor formed by damascene processes between metal interconnect layers and method of forming same

Derryl D. J. Allman; John W. Gregory


Archive | 1999

Integrated circuit device and method of making the same using chemical mechanical polishing to remove material in two layers following masking

John J. Seliskar; Derryl D. J. Allman; John W. Gregory; James P. Yakura; Dim Lee Kwong


Archive | 1998

Apparatus and method of detecting a polishing endpoint layer of a semiconductor wafer which includes a metallic reporting substance

David W. Daniel; John W. Gregory; Derryl D. J. Allman


Archive | 1998

Method and apparatus for detecting a polishing endpoint based upon infrared signals

Derryl D. J. Allman; David W. Daniel; John W. Gregory


Archive | 2001

Method and apparatus for detecting a planarized outer layer of a semiconductor wafer with a confocal optical system

Derryl D. J. Allman; David W. Daniel; John W. Gregory


Archive | 1998

Substrate planarization with a chemical mechanical polishing stop layer

Derryl D. J. Allman; John W. Gregory


Archive | 1998

Apparatus and method of planarizing a semiconductor wafer that includes a first reflective substance and a second reflective substance

John W. Gregory; Derryl D. J. Allman


Archive | 1997

Integrated circuit device and method of making the same

John J. Seliskar; Derryl D. J. Allman; John W. Gregory; James P. Yakura; Dim Lee Kwong

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