Josef Mathuni

Method for etching damaged zones on an edge of a semiconductor substrate, and etching system

Method for damage etching the back side of a semiconductor disk having a protected front side

Plasma etching in-situ cleaning process for vacuum deposition chambers - with separate plasma discharge excitation of etch gas and admission of activated etch gas to chamber

Method for generating excited neutral particles for etching and deposition processes in semiconductor technology with a plasma discharge fed by microwave energy

Method of structuring with metal oxide masks by reactive ion-beam etching

Method for etching a semiconductor substrate and etching system

Device to generate excited/ionized particles in a plasma

Process for etching defective zones on the circumference of semiconductor substrate and etching apparatus

Method for manufacturing a trench capacitor of a one-transistor memory cell in a semiconductor substrate with a self-aligned capacitor plate electrode

Apparatus for plasma-supported back etching of a semiconductor wafer