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Josef Mathuni

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Publication

Featured researches published by Josef Mathuni.

Archive | 1997

Method for etching damaged zones on an edge of a semiconductor substrate, and etching system

Josef Mathuni

Archive | 1996

Method for damage etching the back side of a semiconductor disk having a protected front side

Josef Mathuni

Archive | 1991

Plasma etching in-situ cleaning process for vacuum deposition chambers - with separate plasma discharge excitation of etch gas and admission of activated etch gas to chamber

Heinz Steinhardt; Oswald Spindler; Hans Raske; Josef Mathuni

Archive | 1992

Method for generating excited neutral particles for etching and deposition processes in semiconductor technology with a plasma discharge fed by microwave energy

Heinz Steinhardt; Josef Mathuni

Archive | 1982

Method of structuring with metal oxide masks by reactive ion-beam etching

Josef Mathuni; Karin Unger

Archive | 1997

Method for etching a semiconductor substrate and etching system

Roland Sporer; Josef Mathuni; Alexander Gschwandtner

Archive | 2000

Device to generate excited/ionized particles in a plasma

Heinz Steinhardt; Alexander Gschwandtner; Josef Mathuni

Archive | 1997

Process for etching defective zones on the circumference of semiconductor substrate and etching apparatus

Josef Mathuni

Archive | 1990

Method for manufacturing a trench capacitor of a one-transistor memory cell in a semiconductor substrate with a self-aligned capacitor plate electrode

Siegfried Dr Roehl; Josef Mathuni

Archive | 1996

Apparatus for plasma-supported back etching of a semiconductor wafer

Josef Mathuni

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Heinz Steinhardt

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Alexander Gschwandtner

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Alexander Mattheus

Infineon Technologies

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Roland Sporer

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Hans Raske

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Oswald Spindler

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Siegfried Dr Roehl

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Karin Unger

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