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Juan E. Dominguez

Intel

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Publication

Featured researches published by Juan E. Dominguez.

Archive | 2005

Organometallic precursors for the chemical phase deposition of metal films in interconnect applications

Harsono S. Simka; Juan E. Dominguez; Steven W. Johnston; Adrien R. Lavoie; Kevin P. O'brien

Archive | 2006

Noble metal barrier layers

Adrien R. Lavoie; Juan E. Dominguez; Aaron A. Budrevich

Archive | 2005

Direct tailoring of the composition and density of ALD films

Juan E. Dominguez; Adrien R. Lavoie; Harsono S. Simka; John J. Plombon; David M. Thompson; John Peck

Archive | 2010

Tunable gate electrode work function material for transistor applications

Adrien R. Lavoie; Valery M. Dubin; John J. Plombon; Juan E. Dominguez; Harsono S. Simka; Joseph H. Han; Mark L. Doczy

Archive | 2004

Alloyed underlayer for microelectronic interconnects

Steven W. Johnston; Juan E. Dominguez

Archive | 2005

Amine-free deposition of metal-nitride films

Adrien R. Lavoie; Valery M. Dubin; Juan E. Dominguez; Kevin P. O'brien; Steven W. Johnston; John Peck; David M. Thompson; David Walter Peters

Archive | 2006

Silicon-alloy based barrier layers for integrated circuit metal interconnects

Juan E. Dominguez; Adrien R. Lavoie

Archive | 2005

Carbon nanotube interconnect structures

Florian Gstrein; Valery M. Dubin; Juan E. Dominguez; Adrien R. Lavoie

Archive | 2007

Organometallic precursors for seed/barrier processes and methods thereof

Juan E. Dominguez; Adrien R. Lavoie; John J. Plombon; Joseph H. Han; Harsono S. Simka; David M. Thompson; John Peck

Archive | 2005

Noble metal barrier and seed layer for semiconductors

Steven W. Johnston; Juan E. Dominguez; Michael L. McSwiney

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Adrien R. Lavoie

Intel

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Harsono S. Simka

Intel

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John J. Plombon

Intel

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Steven W. Johnston

Intel

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Valery M. Dubin

Intel

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Joseph H. Han

Intel

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David M. Thompson

Intel

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Ernisse S. Putna

Intel

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Florian Gstrein

Intel

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John Peck

Intel

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