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Dive into the research topics where Jun Yamawaku is active.

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Featured researches published by Jun Yamawaku.


international symposium on semiconductor manufacturing | 2006

Nano-thickness Stellar Defects

Tsuyoshi Moriya; Jun Yamawaku; Yoshitaka Ryu; Hiroshi Nagaike; Hideaki Yakushiji

New type defects which are nanometer-thickness stellar shape defects called as the stellar defects are reported. Since the stellar defects need the center particle and the water to form, we successfully have reduced the stellar defects by reducing the particles and humidity in the chamber. These very thin defects must be key issues in the processes that we have to control nanometer thickness.


international symposium on semiconductor manufacturing | 2007

Vacuum chamber fast dehumidification ∼Water control in semiconductor manufacturing equipment∼

Jun Yamawaku; Tsuyoshi Moriya; Yoshitaka Ryu; Kazumasa Abe; Hideki Yakushiji; Yuki Hosaka; Chie Kato

Water residues become a serious problem in semiconductor manufacturing systems. In this paper, one of the methods to dehumidify in process chamber is proposed and demonstrated. With this technique, conventional evacuation time can be improved by 2times to 3times. We also demonstrated influence of water adsorbed on wafer.


Archive | 2013

FILM DEPOSITION APPARATUS, SUBSTRATE PROCESSING APPARATUS AND FILM DEPOSITION METHOD

Jun Yamawaku; Chishio Koshimizu; Mitsuhiro Tachibana; Hitoshi Kato; Takeshi Kobayashi; Shigehiro Miura; Takafumi Kimura


Archive | 2010

Focus ring heating method, plasma etching apparatus, and plasma etching method

Chishio Koshimizu; Jun Yamawaku; Tatsuo Matsudo; Masashi Saito


Archive | 2008

Substrate transfer module and substrate processing system

Jun Yamawaku; Tsuyoshi Moriya


Archive | 2011

METHOD FOR HEATING PART IN PROCESSING CHAMBER OF SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR MANUFACTURING APPARATUS

Jun Yamawaku; Chishio Koshimizu; Tatsuo Matsudo


Archive | 2013

FILM FORMATION DEVICE, SUBSTRATE PROCESSING DEVICE, AND FILM FORMATION METHOD

Jun Yamawaku; Chishio Koshimizu; Yohei Yamazawa; Mitsuhiro Tachibana; Hitoshi Kato; Takeshi Kobayashi; Shigehiro Miura; Takafumi Kimura


Archive | 2012

Component in processing chamber of substrate processing apparatus and method of measuring temperature of the component

Jun Yamawaku; Chishio Koshimizu; Tatsuo Matsudo


Archive | 2010

Transfer chamber and method for preventing adhesion of particle

Jun Yamawaku; Junji Oikawa; Hiroyuki Nakayama


Archive | 2010

ABSORPTION SPECTROMETRIC APPARATUS FOR SEMICONDUCTOR PRODUCTION PROCESS

Osamu Akiyama; Masashi Akimoto; Tsuyoshi Moriya; Jun Yamawaku

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