K. Ikeda

Negative ion source improvement by introduction of a shutter mask

Studies of a multicusp source were recently done at the National Institute for Fusion Science by plasma grid masking. The maximal H− ion yield is ∼1.4 times greater for the shutter mask case than that for the standard source. Negative ion current evolution during the cesium feed to the masked plasma grid evidenced that about 60% of negative ions are produced on the shutter mask surface, while about 30% are formed on the plasma grid emission hole edges, exposed by cesium with the mask open.

Cesiated hollow cathodes in the multicusp ion source

A cesiated hydrogen hollow cathode (CHC) was tested for plasma injection in the multicusp negative ion source (MS). The CHC arc with hydrogen feed and cesium seeding through the CHC volume was explored. One cathode unit (40 mm length, 19 mm in diameter, emission opening area 1–3 mm2) with no special cooling provided the MS discharge operation with direct current up to 30 A, and up to 60 A in the long-pulse mode. High efficiency of negative ion production in the MS discharge, driven by a CHC plasma injection was recorded.

Plasma Injection From Several Cesiated Hollow Cathodes into Large H− Ion Sources

Compact cesiated hollow cathodes (CHC) has been developed and studied in two large multicusp H− ion sources at NIFS, aiming the long lifetime cathodes for plasma production in the neutral beam injectors. Results on hollow cathodes and power supplies improvement are described. Basic characteristics of multicusp source discharge, driven by several CHCs were studied. Key issues about simultaneous CHCs operation in high current discharge mode are discussed. Each of advanced CHC delivered stable and quiet income with current up to 70A for 5sec to multicusp source discharge. The hollow cathode operation with no Cs feed was obtained by using 30%Xe+70%H2 gas mixture.