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Featured researches published by Kakutaro Suda.


IEEE Journal of Solid-state Circuits | 1996

A 64-bit carry look ahead adder using pass transistor BiCMOS gates

Kiniio Ueda; Hiroaki Suzuki; Kakutaro Suda; Hirofumi Shinohara; Koichiro Mashiko

This paper describes a 64-bit two-stage carry look ahead adder utilizing pass transistor BiCMOS gate. The new pass transistor BiCMOS gate has a smaller intrinsic delay time than conventional BiCMOS gates. Furthermore, this gate has a rail-to-rail output voltage. Therefore the next gate does not have a large degradation of its driving capability. The exclusive OR and NOR gate using the pass transistor BiCMOS gate shows a speed advantage over CMOS gates under a wide variance in load capacitance. The pass transistor BiCMOS gates were applied to full adders, carry path circuits, and carry select circuits. In consequence, a 64-bit two-stage carry look ahead adder was fabricated using a 0.5 /spl mu/m BiCMOS process with single polysilicon and double-metal interconnections. A critical path delay time of 3.5 ns was observed at a supply voltage of 3.3 V. This is 25% better than the result of the adder circuit using CMOS technology. Even at the supply voltage of 2.0 V, this adder is faster than the CMOS adder.


IEEE Journal of Solid-state Circuits | 1991

A 2-ns 16K bipolar ECL RAM with reduced word-line voltage swing

Yasunobu Nakase; Kakutaro Suda; Koichiro Mashiko; Tatsuhiko Ikeda; S. Kayano

A reduced word-line voltage swing (RWS) circuit configuration that results in a high-speed bipolar ECL (emitter coupled logic) RAM is proposed. The write operation can be performed with the configuration in the condition of reduced word-line voltage swing, which causes write operation error in conventional circuit configurations. The proposed configuration cuts off the hold current of the selected memory cell, and then the low-voltage node is charged up through the load p-n-p transistor. A 16-kb ECL RAM with a p-n-p loaded memory cell was fabricated by advanced silicide-base transistor (ASBT) process technology. A 2-ns access time was obtained with 1.8-W power consumption in which the word-line voltage swing was reduced by 0.7 V from a conventional case. Simulation results show that the access time is improved by 25% compared with a conventional case. Simulation results also show that writing time becomes comparable with the conventional time of 1.7 ns when the load p-n-p transistor has a saturation current of 5.0* 10/sup 17/ A and a current gain of 1.0. The saturation current is 5 times larger and the current gain is 5 times smaller than those of the standard lateral p-n-p transistor. >


Archive | 1986

Method for forming silicide electrode in semiconductor device

Kakutaro Suda; Tadashi Hirao


Archive | 1986

Method for fabricating bipolar transistor in integrated circuit

Kakutaro Suda; Tadashi Hirao


Archive | 2001

Method of manufacturing a semiconductor device having a monitor pattern, and a semiconductor device manufactured thereby

Yuichi Sakai; Hiroyuki Chibahara; Masanobu Iwasaki; Kakutaro Suda


Archive | 1987

Method of isolating a semiconductor device using local oxidation

Kakutaro Suda


Archive | 1997

Method of manufacturing semiconductor device having bipolar transistor and field-effect transistor

Takayuki Igarashi; Kakutaro Suda; Yoshitaka Ohtsu


Archive | 1990

Bipolar cross-coupled memory cells having improved immunity to soft errors

Toru Shiomi; Kakutaro Suda; Tetsuo Higuchi


Archive | 2001

Semiconductor device having bipolar transistor and field effect transistor and method of manufacturing the same

Kakutaro Suda


Archive | 1989

Method of manufacturing semiconductor device isolation

Kakutaro Suda

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