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Dive into the research topics where Karl Heinz Schuster is active.

Publication


Featured researches published by Karl Heinz Schuster.


Archive | 2008

Microlithographic projection exposure apparatus

Aurelian Dodoc; Karl Heinz Schuster; Joerg Mallmann; Wilhelm Ulrich; Hans-Juergen Rostalski


Archive | 2004

Microlithographic projection exposure system

Aurelian Dodoc; Karl Heinz Schuster; Jörg Mallmann; Wilhelm Ulrich; Hans-Jürgen Rostalksi


Archive | 2001

Catadioptric microlithographic reduction objective

Karl Heinz Schuster


Archive | 2005

Illumination system for a wavelength of less than or equal to 193 nm, with sensors for determining an illumination

Wolfgang Singer; Martin Antoni; Johannes Wangler; Markus Weiss; Vadim Yevgenyevich Banine; Marcel Dierichs; Roel Moors; Karl Heinz Schuster; Axel Scholz; Philipp Bosselmann; Bernd Warm


Archive | 1997

Double-refracting planar plate arrangement and deep ultraviolet λ/4-plate

Karl Heinz Schuster


Archive | 2000

CATADIOPTIC OBJECTIVE LENS HAVING TWO INTERMEDIATE IMAGES

Gerd Fuerter; Alois Herkommer; Karl Heinz Schuster; David Shafer; Wilhelm Ulrich; Buenau Rudolf Von; アロイス・ヘルコマー; ヴィルヘルム・ウルリッヒ; カール−ハインツ・シュスター; ゲルト・フュルター; デイビッド・シェファー; ビュナウ ルドルフ・フォン


Archive | 2005

Illumination system for a wavelength of ≦ 193 nm, with sensors for determining an illumination

Wolfgang Singer; Martin Antoni; Johannes Wangler; Markus Weiss; Vadim Yevgenyevich Banine; Marcel Dierichs; Roel Moors; Karl Heinz Schuster; Axel Scholz; Philipp Bosselmann; Bernd Warm


Archive | 2007

Prism polarizer e.g. Glan-Thompson polarizer, for e.g. micro lithography-projection illumination system, has prisms, where birefringent characteristics of prisms are independent of stress-induced birefringence in wavelength area of light

Karl Heinz Schuster


Archive | 1997

Achromatic lens system for ultraviolet radiation with germanium dioxide glass

Karl Heinz Schuster


Archive | 2005

Belichtungsvorrichtung und messeinrichtung für eine projektionslinse Exposure apparatus and measuring device for a projection lens

Albrecht Ehrmann; Ulrich Wegmann; Rainer Hoch; Joerg Mallmann; Karl Heinz Schuster

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