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Albrecht Ehrmann

Carl Zeiss AG

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Publication

Featured researches published by Albrecht Ehrmann.

Archive | 2005

Exposure apparatus and measuring device for a projection lens

Albrecht Ehrmann; Ulrich Wegmann; Rainer Hoch; Joerg Mallmann; Karl-Heinz Schuster; Ulrich Loering; Toralf Gruner; Bernhard Kneer; Bernhard Geuppert; Franz Sorg; Jens Kugler; Norbert Wabra

Archive | 2005

System for measuring the image quality of an optical imaging system

Markus Mengel; Ulrich Wegmann; Albrecht Ehrmann; Wolfgang Emer; Reiner Clement; Ludo Mathijssen

Archive | 2003

Device and method for the optical measurement of an optical system, a container therefor, and a microlithography projection exposure machine

Ulrich Wegmann; Uwe Schellhorn; Joachim Stuehler; Helmut Haidner; Albrecht Ehrmann; Martin Schriever; Markus Gobppert

Archive | 2008

Microlithographic projection exposure apparatus and measuring device for a projection lens

Albrecht Ehrmann; Ulrich Wegmann; Rainer Hoch; Joerg Mallmann; Karl-Heinz Schuster; Ulrich Loering; Toralf Gruner; Bernhard Kneer; Bernhard Geuppert; Franz Sorg; Jens Kugler; Norbert Wabra

Archive | 2009

Device and method for the optical measurement of an optical system by using an immersion fluid

Ulrich Wegmann; Uwe Schellhorn; Joachim Stuehler; Albrecht Ehrmann; Martin Schriever; Markus Goeppert; Helmut Haidner

Archive | 2009

Optical system of a microlithographic projection exposure apparatus

Aurelian Dodoc; Albrecht Ehrmann; Sascha Bleidistel

Archive | 2016

APPARATUS FOR DETERMINING AN OPTICAL PROPERTY OF AN OPTICAL IMAGING SYSTEM

Albrecht Ehrmann; Markus Goeppert; Helmut Haidner

Archive | 2015

Vorrichtung zum Bestimmen einer optischen Eigenschaft eines optischen Abbildungssystems

Albrecht Ehrmann; Markus Göppert; Helmut Haidner

Archive | 2010

Measuring system for the optical measurement of projecting object lens of micro-lithography projection exposure system

Markus Mengel; Ulrich Wegmann; Albrecht Ehrmann; Wolfgang Emer; Reiner Clement; Ludo Mathijssen

Archive | 2009

METHOD AND APPARATUS FOR DETERMINING AN OPTICAL CHARACTERISTIC OF AN OPTICAL IMAGING SYSTEM

Albrecht Ehrmann; Markus Göppert; Helmut Haidner

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Collaboration

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Ulrich Wegmann

Carl Zeiss AG

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Helmut Haidner

Carl Zeiss AG

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Joerg Mallmann

Carl Zeiss AG

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Rainer Hoch

Carl Zeiss AG

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Aurelian Dodoc

Carl Zeiss AG

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Karl Heinz Schuster

Carl Zeiss AG

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Sascha Bleidistel

Carl Zeiss AG

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Bernhard Geuppert

Carl Zeiss AG

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Bernhard Kneer

Carl Zeiss AG

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Franz Sorg

Carl Zeiss AG

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