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Transactions of the Japan Society of Mechanical Engineers. C | 1995

Modeling of Three-Degree-of-Freedom Fine Motion Mechanism and Improvement of Control Performance.

Shinji Wakui; Katsumi Asada

As miniaturization of exposure patterns progresses, high positioning accuracy of submicron order is necessary for the semiconductor components. Moreover, in order to transcribe the circuit pattern to multiple positions on an IC wafer, a positioning mechanism with long stroke also must be developed. This paper focuses on the former. By driving the piezo actuators mounted under the flat plate, this mechanism has a positioning function with 3 degrees of freedom. This paper first describes a mathematical model of a fine motion mechanism with 3 d. o. f., and we confirm the adequacy of the control model by comparison with the measured frequency response. Secondly, both static and dynamic decoupling conditions for the controlled object itself are derived, and we show that this conditions are equivalent to that of the center of percussion. In the case of control for the positioning mechanism with multi-d. o. f., the matrix inversions are generally inserted into the control loop to cancel the interference based on the space assignment of both the position sensors and actuators. However, if the controlled object can be kinematically decoupled by the mechanical design, it is unnecessary to construct the complex control loop. Finally, we propose acceleration feedback in order to improve the control performance, and its superior performance is illustrated by the numerical simulation.


Archive | 1993

Stage driving system

Shinji Wakui; Mikio Sato; Katsumi Asada


Archive | 1993

Precision positioning apparatus

Mikio Sato; Katsumi Asada; Shinji Wakui


Archive | 1997

Stage and exposure apparatus using same

Eiji Osanai; Mitsuru Inoue; Kazunori Iwamoto; Katsumi Asada; Hiroshi Ito


Archive | 2006

OPTICAL ELEMENT HOLDING APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

Shigeo Sakino; Hirohito Ito; Shinji Uchida; Choshoku Sai; Katsumi Asada


Archive | 2006

Reflecting mirror and exposure apparatus using the same

Shinji Uchida; Choshoku Sai; Katsumi Asada; Hirohito Ito; Shigeo Sakino


Journal of robotics and mechatronics | 1993

Positioning of an X-Y Stage Using the Horizontal Acceleration Signal of the Base Plate

Shinji Wakui; Mikio Sato; Katsumi Asada; Takeshi Sawada


Archive | 2011

VIBRATION CONTROL APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

Ryo Nawata; Katsumi Asada


Archive | 2004

STAGE EQUIPMENT, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

Katsumi Asada; Giichi Miyajima; Toshihiko Nishida; Naoaki Nishimura; Yasuto Sasaki; Hitoshi Sato; Hideo Tanaka; 康人 佐々木; 仁至 佐藤; 義一 宮島; 克己 浅田; 英雄 田中; 敏彦 西田; 直亮 西邑


Archive | 2007

APPARATUS FOR MOVING CURVED-SURFACE MIRROR, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

Katsumi Asada

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Shinji Wakui

Tokyo University of Agriculture and Technology

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Hideo Tanaka

Taisho Pharmaceutical Co.

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