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Katsunori Nakajima

Hitachi

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Publication

Featured researches published by Katsunori Nakajima.

Archive | 1997

Active matrix type liquid crystal display device having chromium alloy connecting portions at pixel electrode or near driving circuit terminals

Kenichi Onisawa; Kikuo Ono; Toshiki Kaneko; Kenichi Chahara; Katsunori Nakajima; Etsuko Nishimura; Takeshi Satou; Tetsuro Minemura

Archive | 1997

Active-matrix liquid crystal display unit in which gate and/or data lines are made of Cr containing Ne-atoms

Katsunori Nakajima; Kenichi Onisawa; Kenichi Chahara; Mitsuhiro Kamei

Archive | 2008

Probe Storage Container, Prober Apparatus, Probe Arranging Method and Manufacturing Method of Probe Storage Container

Masanori Gunji; Katsunori Nakajima; Yasuhiko Nara; Tsutomu Saito; Shigeru Izawa

Archive | 2001

Active matrix type liquid crystal display device having chromium alloy connecting portions which are other than the material of the data line or gate line

Kenichi Onisawa; Kikuo Ono; Toshiki Kaneko; Kenichi Chahara; Katsunori Nakajima; Etsuko Nishimura; Takeshi Satou; Tetsuro Minemura

Archive | 1999

Gas supply apparatus and film forming apparatus

Katsunori Nakajima; Hiroyuki Shida; Eiji Setoyama; Koji Ishiguro; Hikaru Saruta

Vacuum | 1998

Uniformity improvement in dc magnetron sputtering deposition on a large area substrate

Tomoyuki Seino; Y Kawakubo; Katsunori Nakajima; Mitsuhiro Kamei

Archive | 1998

Plasma treating device and gas-feeding method

Masayuki Hachitani; Koji Ishiguro; Katsunori Nakajima; Katsumi Oyama; Hidetsugu Setoyama; Hiroyuki Shida; 勝範 中島; 勝美 大山; 啓之 志田; 英嗣 瀬戸山; 浩二 石黒; 昌幸 蜂谷

Archive | 1998

Gas supply device and film forming device

Koji Ishiguro; Katsunori Nakajima; Hikari Saruta; Hidetsugu Setoyama; Hiroyuki Shida; 勝範 中島; 啓之 志田; 英嗣 瀬戸山; 光 猿田; 浩二 石黒

Archive | 2003

SUBSTRATE PROCESSING DEVICE AND METHOD FOR HOLDING SUBSTRATE IN THE SUBSTRATE PROCESSING DEVICE

Tatsuya Fujisawa; Masaki Kondo; Katsunori Nakajima; Satoshi Umehara; 勝範 中島; 諭 梅原; 達哉 藤沢; 正樹 近藤

Vacuum | 1998

Stress reduction of chromium thin films deposited by cluster-type sputtering system for ultra-large-size (550×650 mm) substrates

Katsunori Nakajima; Kenichi Onisawa; Kenichi Chahara; Tetsuroh Minemura; Mitsuhiro Kamei; Eiji Setoyama

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Kenichi Chahara

Hitachi

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Kenichi Onisawa

Hitachi

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Hiroyuki Shida

Hitachi

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Koji Ishiguro

Hitachi

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Mitsuhiro Kamei

Hitachi

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Eiji Setoyama

Hitachi

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Etsuko Nishimura

Hitachi

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Hikaru Saruta

Hitachi

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Kikuo Ono

Hitachi

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Takeshi Satou

Hitachi

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