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Dive into the research topics where Kazuo Shirahashi is active.

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Featured researches published by Kazuo Shirahashi.


international electron devices meeting | 1990

A new a-Si TFT with Al/sub 2/O/sub 3//SiN double-layered gate insulator for 10.4-inch diagonal multicolor display

Hideaki Yamamoto; Haruo Matsumaru; Kazuo Shirahashi; M. Nakatani; Akira Sasano; Nobutake Konishi; Ken Tsutsui; Toshihisa Tsukada

A novel a-Si TFT (thin film transistor) with an Al gate electrode and an Al/sub 2/O/sub 3//SiN double-layered gate insulator has been developed and successfully applied to a 10.4-in diagonal multicolor display panel. Al is a low resistivity metal and it is also possible to form Al/sub 2/O/sub 3/ by anodic oxidation. These features contribute greatly to decreasing the number of defects in the panel and are indispensable for manufacturing a large-size display. The Al, which is used as a gate electrode, can also be used as a gate bus-line metal. As a result, the gate bus-line resistance of the panel can be reduced to about 2 k Omega , which is quite effective for improving the image quality of the panel.<<ETX>>


Archive | 1990

Thin film transistor substrate, liquid crystal display panel and liquid crystal display equipment

Hideaki Yamamoto; Haruo Matsumaru; Yasuo Tanaka; Ken Tsutsui; Toshihisa Tsukada; Kazuo Shirahashi; Akira Sasano; Yuka Matsukawa


Archive | 1992

Liquid crystal display device having peripheral dummy lines

Kazuo Shirahashi; Yuka Matsukawa; Akira Sasano; Hideaki Taniguchi; Hideaki Yamamoto; Haruo Matsumaru


Archive | 1991

Liquid crystal display device with TFT's each including a Ta gate electrode and an anodized Al oxide film

Hideaki Taniguchi; Kazuo Shirahashi; Yuka Matsukawa; Haruo Matsumaru; Akira Sasano


Archive | 1997

Thin film transistor substrate, manufacturing method thereof, liquid crystal display panel and liquid crystal display equipment

Hideaki Yamamoto; Haruo Matsumaru; Yasuo Tanaka; Ken Tsutsui; Toshihisa Tsukada; Kazuo Shirahashi; Akira Sasano; Yuka Matsukawa


Archive | 1993

Liquid crystal display device with tfts in which pixel electrodes are formed in the same plane as the gate electrodes with anodized oxide films before the deposition of silicon

Akira Sasano; Kazuo Shirahashi; Yuka Matsukawa; Hideaki Taniguchi; Hideaki Yamamoto; Haruo Matsumaru


Archive | 1994

Matrix liquid crystal, display device having testing pads of transparent conductive film

Hideaki Yamamoto; Kazuo Shirahashi; Haruo Matsumaru; Michio Tsukii


Archive | 1995

LCD device with TFTs in which pixel electrodes are formed in the same plane as the gate electrodes with anodized oxide films and before the deposition of the silicon gate insulator

Akira Sasano; Kazuo Shirahashi; Yuka Matsukawa; Hideaki Taniguchi; Hideaki Yamamoto; Haruo Matsumaru


Archive | 1993

Method of manufacturing a thin film transistor substrate

Hideaki Yamamoto; Haruo Matsumaru; Yasuo Tanaka; Ken Tsutsui; Toshihisa Tsukada; Kazuo Shirahashi; Akira Sasano; Yuka Matsukawa


Archive | 1995

Method for making LCD device in which gate insulator of TFT is formed after the pixel electrode but before the video signal line

Akira Sasano; Kazuo Shirahashi; Yuka Matsukawa; Hideaki Taniguchi; Hideaki Yamamoto; Haruo Matsumaru

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