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Featured researches published by Keiko Yano.


Synthetic Metals | 1997

Synthesis and applications of sulfonated polyaniline

Shigeru Shimizu; T. Saitoh; M. Uzawa; M. Yuasa; Keiko Yano; Takashi Maruyama; Keiji Watanabe

We present new synthesis and applications of fully-sulfonated polyaniline(SPAN), a self-doped conducting polymer. It is difficult to make polymers of aniline sulfonic acids(ASA) with a high molecular weight, since reactivity of ASA as a monomer is low due to the presence of an electron attractive sulfonic group. We prepared a high molecular weight poly(aniline sulfonic acid)(PAS) with a high yield by polymerizing the ASA having an electron donative group under basic conditions. The conducting polymer materials based on this polymer were developed for a variety of applications including; Over Coated Film for Resists (aquaSAVE®) — Charge prevention for e-beam lithography and improvement of post-exposure delay(PED) latitude for Chemical amplified resists. Conductive Bottom Layers of Multi level Resists — Reduction of gate oxide damage in metal etching, etc.


Archive | 1990

Electron beam exposure data processing method, electron beam exposure method and apparatus

Keiko Yano


Archive | 1994

Composition for irradiation with ionizing radiation and method of irradiating ionizing irradiation

Masami Ishikawa; Takashi Maruyama; Tomio Nakamura; Takahisa Namiki; Takashi Saito; Shigeru Shimizu; Masashi Uzawa; Keiji Watabe; Ei Yano; Keiko Yano; 崇久 並木; 富雄 中村; 隆司 丸山; 隆 斉藤; 茂 清水; 慶二 渡部; 恵子 矢野; 映 矢野; 雅美 石川; 正志 鵜沢


Archive | 1995

Composition for forming an electrically conductive layer to be used in patterning

Keiji Watanabe; Yasuhiro Yoneda; Takashi Maruyama; Keiko Yano; Tomio Nakamura; Shigeru Shimizu; Takashi Saitoh


Archive | 1996

Ionizing radiation exposure method utilizing water soluble aniline antistatic polymer layer

Keiji Watanabe; Ei Yano; Takahisa Namiki; Keiko Yano; Takashi Maruyama; Tomio Nakamura; Shigeru Shimizu; Takashi Saitoh; Masashi Uzawa; Masami Ishikawa


Archive | 1990

Method of forming pattern by using an electroconductive composition

Keiji Watanabe; Yasuhiro Yoneda; Koichi Kobayashi; Keiko Yano; Tomio Nakamura; Shigeru Shimizu


Archive | 1998

Resist developing apparatus used in process for production of semiconductor device

Takashi Maruyama; Tatsuo Chijimatsu; Koichi Kobayashi; Keiko Yano; Hiroyuki Kanata


Archive | 1997

Processes for forming resist pattern and for producing semiconductor device

Keiji Watanabe; Miwa Igarashi; Ei Yano; Keiko Yano; Takashi Maruyama; Eiichi Hoshino; Kotaro Shirabe; Masafumi Nakaishi


Archive | 1995

Composition for forming resist pattern and resist pattern forming method

Takashi Maruyama; Shigeru Shimizu; Masashi Uzawa; Keiji Watabe; Ei Yano; Keiko Yano; Masami Yuasa; 隆司 丸山; 茂 清水; 慶二 渡部; 雅美 湯浅; 恵子 矢野; 映 矢野; 正志 鵜沢


Archive | 1998

Process for production of semiconductor device and resist developing apparatus used therein

Takashi Maruyama; Tatsuo Chijimatsu; Koichi Kobayashi; Keiko Yano; Hiroyuki Kanata

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