Tomio Nakamura | Researchain

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Featured researches published by Tomio Nakamura.

Archive | 1994

Composition for irradiation with ionizing radiation and method of irradiating ionizing irradiation

Masami Ishikawa; Takashi Maruyama; Tomio Nakamura; Takahisa Namiki; Takashi Saito; Shigeru Shimizu; Masashi Uzawa; Keiji Watabe; Ei Yano; Keiko Yano; 崇久並木; 富雄中村; 隆司丸山; 隆斉藤; 茂清水; 慶二渡部; 恵子矢野; 映矢野; 雅美石川; 正志鵜沢

Archive | 1995

Composition for forming an electrically conductive layer to be used in patterning

Keiji Watanabe; Yasuhiro Yoneda; Takashi Maruyama; Keiko Yano; Tomio Nakamura; Shigeru Shimizu; Takashi Saitoh

Archive | 1992

Sulfonated aniline-type copolymer and process for production thereof

Shigeru Shimizu; Takashi Saitoh; Tomio Nakamura

Archive | 1996

Ionizing radiation exposure method utilizing water soluble aniline antistatic polymer layer

Keiji Watanabe; Ei Yano; Takahisa Namiki; Keiko Yano; Takashi Maruyama; Tomio Nakamura; Shigeru Shimizu; Takashi Saitoh; Masashi Uzawa; Masami Ishikawa

Archive | 1990

Method of forming pattern by using an electroconductive composition

Keiji Watanabe; Yasuhiro Yoneda; Koichi Kobayashi; Keiko Yano; Tomio Nakamura; Shigeru Shimizu

Archive | 1989

Conducting varnish composition

Tomio Nakamura; Shigeru Shimizu; Kikuko Takeuchi

Archive | 1990

Exposure mask covering semiconductor composition, exposure mask and pattern transfer process using the mask

Tomio Nakamura; Tomio Ozeki; Shigeru Shimizu; Fumio Yoshimura

Archive | 1998

Highly pure squalane, raw material for pharmaceuticals and cosmetics prepared by using the same and method for producing the same

Atsushi Kaiya; Tomio Nakamura; Hironaka Wada

Archive | 1997

Composition for forming conductivity imparting agent and pattern forming method

Keiji Watanabe; Yasuhiro Yoneda; Takashi Maruyama; Keiko Yano; Tomio Nakamura; Shigeru Shimizu; Takashi Saitoh; Takahisa Namiki; Ei Yano; Miwa Igarashi; Yoko Kuramitsu

Archive | 1992