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Dive into the research topics where Kenji Tamamori is active.

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Featured researches published by Kenji Tamamori.


Journal of Vacuum Science & Technology B | 2007

Optical properties of a multibeam column with a single-electron source

Osamu Kamimura; Sayaka Tanimoto; Hiroya Ohta; Yoshinori Nakayama; Makoto Sakakibara; Yasunari Sohda; Masato Muraki; Susumu Gotoh; Masaki Hosoda; Yasuhiro Someda; Kenji Tamamori; Futoshi Hirose; Kenichi Nagae; Kazuhiko Kato; Masahiko Okunuki

A novel single-column multi-electron-beam system, called a beam-split array, has been developed for a high-resolution, high-throughput lithography tool. In this system, a single electron beam is divided into 1024 beams by a multisource module (MSM) composed of an aperture array (a beam-dividing aperture), a static lens array (Einzel lenses for each divided beam), and a blanker array (BLA, blanking electrode pairs for each focused beam). The MSM is used to form multiple intermediate images of the electron source at the BLA. These images are demagnified to form final images through a projection optics consisting of a double lens doublet with a blanking aperture and deflector. To align the multiple beam paths in the MSM, aligners between these arrays are used, and the aligner conditions are determined by monitoring the blanking-aperture image. Moreover, because each beam current is about 0.1% of the total beam current on the specimen, a high-contrast transmission detection method is used to detect the electr...


international microprocesses and nanotechnology conference | 1999

High precision binary optical element fabricated by novel self aligned process

Ichiro Tanaka; Yuichi Iwasaki; Makoto Ogusu; Kenji Tamamori; Yoshiyuki Sekine; Takahiro Matsumoto; Hiroshi Maehara; Ryusho Hirose

Binary optical elements (BOE) tend to be used frequently in optical equipment because aspherical type BOE is easy to fabricate and the BOE can easily correct chromatic aberration. What makes this technology attractive to industry is that the BOE can be fabricated precisely by the semiconductor micro fabrication technique. However when it is used for more precise optics e.g. semiconductor exposure equipment, more precise BOE are necessary. In some manufacturing processes, we have confirmed that the alignment error between masks is the dominant factor to decrease diffraction efficiency by optical simulation. To study this problem, we have produced a BOE using a novel self-alignment method we have devised, then compared it to a BOE which has being made by a conventional method.


Japanese Journal of Applied Physics | 2007

Fabrication of Three-Dimensional Photonic Crystal Device for Terahertz Wave

Kenji Tamamori; Toshihiko Ouchi; Takeaki Itsuji; Shinan Wang; Ryoji Kurosaka; Haruhito Ono

We have fabricated a simple-cubic-lattice photonic crystal (PhC) device based on high-resistivity silicon in the terahertz (THz) range by micro-electro-mechanical system (MEMS) techniques. The lattice constant of the three-dimensional (3D) PhC device is 120 µm, resulting in a photonic band gap (PBG) centered at 1 THz. The 3D PhC device was constructed by stacking ten 120-µm-thick chips with periodic pillars and holes patterned respectively on both of their sides by Si deep reactive ion etching. By THz time-domain spectroscopy, the PBG of the device was observed between 0.83 and 1.17 THz in the Γ–Z direction with a transmittance attenuation of about 35 dB, which is in good agreement with a numerical calculation result.


Journal of Vacuum Science & Technology B | 2007

Inspection of all beams in multielectron beam system

Sayaka Tanimoto; Masakazu Sugaya; Akihiro Furukawa; Yasunari Sohda; Masaki Hosoda; Yasuhiro Someda; Masato Muraki; Kenji Tamamori; Futoshi Hirose; Kenichi Nagae; Kazuhiko Kato

A testing apparatus for inspecting the beams formed by a multisource module (MSM) was built for the feasibility study of a beam splitting array (BSA), a multielectron beam system the authors are developing. In this BSA, the MSM plays the following three key roles: splitting the beam from a single cathode into 32×32 beams, converging the 32×32 beams, and blanking them individually. Accordingly, the inspection of all beams formed by the MSM is essential for the feasibility study of the system. The testing apparatus was therefore designed for measuring all the beams formed by the MSM without demagnifying them. To maintain the accuracy during the inspection of all 32×32 beams, the measurement process was automated. This testing apparatus was used to measure the diameters and misalignments of all beams formed by a prototype MSM. As a result, the mean values of the transverse and the longitudinal diameters were found to be 0.88 and 0.92μm, respectively. A single stigmator can cancel the difference between these...


Archive | 2004

Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus using deflector

Haruhito Ono; Masatake Akaike; Kenji Tamamori; Futoshi Hirose; Yasushi Koyama; Atsunori Terasaki; Kenichi Nagae; Yoshinori Nakayama


Archive | 2009

Element array, electromechanical conversion device, and process for producing the same

Takahiro Ezaki; Chienliu Chang; Yasuhiro Soeda; Kenji Tamamori


Archive | 1998

Diffractive optical element and optical system having the same

Hideo Kato; Hiroshi Maehara; Kenji Tamamori


Archive | 2003

Array structure and method of manufacturing the same, charged particle beam exposure apparatus, and device manufacturing method

Kenji Tamamori; Masato Muraki; Yuichi Iwasaki; Yoshinori Nakayama; Kouji Asano; Yoshiaki Moro; Masayoshi Esashi


Archive | 2007

Process for formation of three-dimensional photonic crystal

Shinan Wang; Kenji Tamamori; Haruhito Ono; Masahiko Okunuki


Archive | 2003

Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus

Yuichi Iwasaki; Masato Muraki; Kenji Tamamori; Kouji Asano; Masayoshi Esashi; Yoshinori Nakayama; Shinichi Hashimoto; Yoshiaki Moro

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