Kenneth Wo-Wai Au

High temperature oxide deposition process for fabricating an ONO floating-gate electrode in a two bit EEPROM device

Nitridation process for fabricating an ONO floating-gate electrode in a two-bit EEPROM device

Method of fabricating an ONO dielectric by nitridation for MNOS memory cells

Integrated method by using high temperature oxide for top oxide and periphery gate oxide

Thin floating gate and conductive select gate in situ doped amorphous silicon material for NAND type flash memory device applications

Method for providing a dopant level for polysilicon for flash memory devices

Method of forming select gate to improve reliability and performance for NAND type flash memory devices

Method of forming high K tantalum pentoxide Ta2O5 instead of ONO stacked films to increase coupling ratio and improve reliability for flash memory devices

Methods and arrangements for forming a single interpoly dielectric layer in a semiconductor device

Method of forming ono stacked films and DCS tungsten silicide gate to improve polycide gate performance for flash memory devices