Ki-Vin Im

Method of forming a layer and forming a capacitor of a semiconductor device having the same layer

Method of forming a layer and method of forming a capacitor of a semiconductor device having the same

METHODS OF FORMING METAL THIN FILMS, LANTHANUM OXIDE FILMS, AND HIGH DIELECTRIC FILMS FOR SEMICONDUCTOR DEVICES USING ATOMIC LAYER DEPOSITION

Methods and apparatus for forming dielectric structures in integrated circuits

Capacitor of semiconductor memory device that has composite Al2O3/HfO2 dielectric layer and method of manufacturing the same

Apparatus and method for supplying a source, and method of depositing an atomic layer using the same

METHOD OF FORMING A LAYER AND METHOD OF MANUFACTURING A CAPACITOR USING THE SAME

High performance MIS capacitor with HfO2 dielectric

Semiconductor Devices Including Capacitor Support Pads and Related Methods

Method of manufacturing semiconductor devices including capacitor support pads