Koji Takayanagi

Resist process optimization for further defect reduction

Defect reduction has become one of the most important technical challenges in device mass-production. Knowing that resist processing on a clean track strongly impacts defect formation in many cases, we have been trying to improve the track process to enhance customer yield. For example, residual type defect and pattern collapse are strongly related to process parameters in developer, and we have reported new develop and rinse methods in the previous papers. Also, we have reported the optimization method of filtration condition to reduce bridge type defects, which are mainly caused by foreign substances such as gels in resist. Even though we have contributed resist caused defect reduction in past studies, defect reduction requirements continue to be very important. In this paper, we will introduce further process improvements in terms of resist defect reduction, including the latest experimental data.

Resist dispense system for further defect reduction

As pattern size becomes smaller, requirement for defect reduction is getting higher and higher. It is known that defects occur in various steps of lithography process. In this study, we focus on defects related to the resist dispense system. Of those defects, the most typical is bridge type defect which caused by foreign substances contained in resist film. The source of those is considered to be insoluble substances, such as resist gels, in resist liquid. So far, the conventional countermeasure has been the development of resist line filters (optimization of materials, shrinking of pore size, and so on). But, according to the recent reports and our experimental result, we can say that not only filter type but also filtration condition has certain influence on bridge type defect generation. In this study, we examine the influences of resist dispense system and its parameters on bridge type defect generation. This paper provides some experimental data and introduces our approaches to the optimization of resist dispense system and its effects.