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Dive into the research topics where Kotaro Akutsu is active.

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Featured researches published by Kotaro Akutsu.


Proceedings of SPIE | 2014

High volume production trial of mirror segments for the Thirty Meter Telescope

Tetsuji Oota; Mahito Negishi; Hirohiko Shinonaga; Akihiko Gomi; Yutaka Tanaka; Kotaro Akutsu; Itaru Otsuka; Shun Mochizuki; Masanori Iye; Takuya Yamashita

The Thirty Meter Telescope is a next-generation optical/infrared telescope to be constructed on Mauna Kea, Hawaii toward the end of this decade, as an international project. Its 30 m primary mirror consists of 492 off-axis aspheric segmented mirrors. High volume production of hundreds of segments has started in 2013 based on the contract between National Astronomical Observatory of Japan and Canon Inc.. This paper describes the achievements of the high volume production trials. The Stressed Mirror Figuring technique which is established by Keck Telescope engineers is arranged and adopted. To measure the segment surface figure, a novel stitching algorithm is evaluated by experiment. The integration procedure is checked with prototype segment.


Proceedings of SPIE | 2012

Test production of a mirror segment for the Thirty Meter Telescope

Tetsuji Oota; Hirohiko Shinonaga; Kotaro Akutsu; Yuichiro Hashimoto; Itaru Otsuka; Yasushi Iwasaki; Masanori Iye; Takuya Yamashita; Hiroshi Akitaya; Ryuji Suzuki

The Thirty Meter Telescope (TMT) is a next-generation optical/infrared telescope to be constructed on Mauna Kea, Hawaii toward the end of this decade, as an international project. Its 30 m primary mirror consists of 492 off-axis aspheric segmented mirrors. This paper describes the progress of the test fabrication of an outermost mirror segment for the TMT as a joint R&D program between National Astronomical Observatory and Canon. A zero-expansion glass CLEARCERAM™ blank was polished by a computer-controlled small-tool polishing machine (CSSP, Canon) and its surface shape was measured by a touch-probe measuring machine(A-Ruler, Canon). Residuals of lower Zernike terms of the surface shape were 11 nmRMS, clearing the original specifications based on the structure function. There remains, however, a need to fulfill latest revised specifications. Possible solutions to improve and achieve the new specifications and a plan for revising the process for mass production are also described.


Archive | 1996

Positioning system and method and apparatus for device manufacture

Yukio Yamane; Eiji Osanai; Kotaro Akutsu


Archive | 1998

Positioning apparatus and exposure apparatus using the same

Eiji Osanai; Kotaro Akutsu; Hirohito Ito


Archive | 1990

Device for positioning control

Shinji Ohishi; Kotaro Akutsu; Toshikazu Sakai


Archive | 2000

Positioning device, exposure device, and device manufacturing method

Hirohito Ito; Kotaro Akutsu


Archive | 1996

Moving stage apparatus and system using the same

Shinichi Chiba; Kotaro Akutsu


Archive | 1997

Stage apparatus and exposure apparatus and device producing method using the same

Eiji Osanai; Kotaro Akutsu


Archive | 1999

Positioning system and position measuring method for use in exposure apparatus

Eiji Osanai; Kotaro Akutsu


Archive | 1997

Stage feeding device

Kotaro Akutsu; Eiji Osanai; Hirohito Ito

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Masanori Iye

Graduate University for Advanced Studies

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