Kouros Ghandehari

Semiconductor manufacturing resolution enhancement system and method for simultaneously patterning different feature types

Method of forming integrated circuit features by oxidation of titanium hard mask

RELACS shrink method applied for single print resist mask for LDD or buried bitline implants using chemically amplified DUV type photoresist

Flash memory with controlled wordline width

Application of the CVD bilayer ARC as a hard mask for definition of the subresolution trench features between polysilicon wordlines

Attenuated phase shift mask for use in EUV lithography and a method of making such a mask

Attenuating extreme ultraviolet (euv) phase-shifting mask fabrication method

Method for using phase-shifting mask

Hard mask spacer for sublithographic bitline

Binary and attenuating phase-shifting masks for multiple wavelengths