Angela Hui

Simplified dual damascene process for multi-level metallization and interconnection structure

PROCESS FOR FABRICATING AN INTEGRATED CIRCUIT WITH A SELF-ALIGNED CONTACT

RELACS shrink method applied for single print resist mask for LDD or buried bitline implants using chemically amplified DUV type photoresist

Formation of STI (shallow trench isolation) structures within core and periphery areas of flash memory device

Method of manufacturing spacer etch mask for silicon-oxide-nitride-oxide-silicon (SONOS) type nonvolatile memory

Innovative method of hard mask removal

Method for fabricating a memory device having reverse LDD

Method and system for forming dual gate structures in a nonvolatile memory using a protective layer

Hard mask removal process

Vereinfachter doppel-damaszenen prozess für die herstellung einer mehrlagen-metallisierung und einer verbindungsstruktur