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Dive into the research topics where Jeffrey A. Shields is active.

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Featured researches published by Jeffrey A. Shields.


international symposium on semiconductor manufacturing | 1999

Metal rework yield loss-mechanisms and solutions

Jeffrey A. Shields; Kelwin Ko; R. Rios; L. Mercado

Metal mask rework has been demonstrated to have a dramatic effect on product yield. We have undertaken an exhaustive study to determine the mechanisms behind the yield loss and to develop a benign metal mask rework solution. We have identified two separate mechanisms for potential yield loss associated with metal mask rework; copper precipitation from high temperature plasma strip and chemical penetration of thin TiN ARC layers.


Archive | 1999

TIN CONTACT BARC FOR TUNGSTEN POLISHED CONTACTS

Jeffrey A. Shields; Ramkumar Subramanian; Bharath Rangarajan


Archive | 1998

Borderless vias with HSQ gap filled patterned metal layers

Robert C. Chen; Jeffrey A. Shields; Robert Dawson; Khanh Tran


Archive | 2002

Memory wordline hard mask

Arvind Halliyal; Tazrien Kamal; Minh Van Ngo; Mark T. Ramsbey; Jeffrey A. Shields; Jean Y. Yang; Emmanuil H. Lingunis; Angela T. Hui; Jusuke Ogura


Archive | 2004

UV-BLOCKING LAYER FOR REDUCING UV-INDUCED CHARGING OF SONOS DUAL-BIT FLASH MEMORY DEVICES IN BEOL PROCESSING

Minh Van Ngo; Tazrien Kamal; Mark T. Ramsbey; Arvind Halliyal; Jaeyong Park; Ning Cheng; Jeff P. Erhardt; Clarence Ferguson; Jeffrey A. Shields; Angela T. Hui; Robert A. Huertas; Tyagamohan Gottipati


Archive | 2001

Process for reducing the critical dimensions of integrated circuit device features

Uzodinma Okoroanyanwu; Chih-Yuh Yang; Jeffrey A. Shields


Archive | 1999

Method of using a silicon oxynitride ARC for final metal layer

Jeffrey A. Shields; Bharath Rangarajan


Archive | 2000

Double self-aligning shallow trench isolation semiconductor and manufacturing method therefor

Allen S. Yu; Jeffrey A. Shields


Archive | 2002

Method of making memory wordline hard mask extension

Tazrien Kamal; Minh Van Ngo; Mark T. Ramsbey; Jeffrey A. Shields; Jean Y. Yang; Emmanuil H. Lingunis; Hidehiko Shiraiwa; Angela T. Hui


Archive | 1999

HSQ with high plasma etching resistance surface for borderless vias

Jeffrey A. Shields; Khanh Tran; Robert C. Chen; Robert Dawson

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Khanh Tran

Advanced Micro Devices

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