Krit Athikulwongse

A study of Through-Silicon-Via impact on the 3D stacked IC layout

Through-Silicon-Via (TSV) is the enabling technology for the finegrained 3D integration of multiple dies into a single stack. These TSVs occupy non-negligible silicon area because of their sheer size. This significant silicon area occupied by the TSVs and the interconnections made to the TSVs greatly affect area, power, performance, and reliability of 3D IC layouts. Well-managed TSVs alleviate congestion, reduce wirelength, and improve performance, whereas excessive TSVs not only increase the die area, but also have negative impact on many design objectives. In this paper, we study the impact of TSV on various aspects of 3D layouts. We use GDSII layouts of 2D and 3D designs, and thoroughly compare the pros and cons of TSV usage. We propose a new force-directed 3D gate-level placement that efficiently handles TSVs. In addition, we present an algorithm that assigns TSVs to nets to complete routing that involves TSVs. This algorithm, together with our 3D placer, is integrated into a commercial P&R tool to generate fully validated GDSII layouts. Our experiments based on synthesized benchmarks indicate that our algorithms help generate GDSII layouts of 3D designs that are optimized in terms of area, wirelength, and metal layer count.

3D-MAPS: 3D Massively parallel processor with stacked memory

Several recent works have demonstrated the benefits of through-silicon-via (TSV) based 3D integration, but none of them involves a fully functioning multicore processor and memory stacking. 3D-MAPS (3D Massively Parallel Processor with Stacked Memory) is a two-tier 3D IC, where the logic die consists of 64 general-purpose processor cores running at 277MHz, and the memory die contains 256KB SRAM. Fabrication is done using 130nm GlobalFoundries device technology and Tezzaron TSV and bonding technology. Packaging is done by Amkor. This processor contains 33M transistors, 50K TSVs, and 50K face-to-face connections in 5x5mm2 footprint. The chip runs at 1.5V and consumes up to 4W, resulting in 16W/cm2 power density. The core architecture is developed from scratch to benefit from single-cycle access to SRAM.

TSV stress aware timing analysis with applications to 3D-IC layout optimization

As the geometry shrinking faces severe limitations, 3D wafer stacking with through silicon via (TSV) has gained interest for future SOC integration. Since TSV fill material and silicon have different coefficients of thermal expansion (CTE), TSV causes silicon deformation due to different temperatures at chip manufacturing and operating. The widely used TSV fill material is copper which causes tensile stress on silicon near TSV. In this paper, we propose systematic TSV stress aware timing analysis and show how to optimize layout for better performance. First, we generate a stress contour map with an analytical radial stress model. Then, the tensile stress is converted to hole and electron mobility variations depending on geometric relation between TSVs and transistors. Mobility variation aware cell library and netlist are generated and incorporated in an industrial timing engine for 3D-IC timing analysis. It is interesting to observe that rise and fall time react differently to stress and relative locations with respect to TSVs. Overall, TSV stress induced timing variations can be as much as ± 10% for an individual cell. Thus as an application for layout optimization, we can exploit the stress-induced mobility enhancement to improve timing on critical cells. We show that stress-aware perturbation could reduce cell delay by up to 14.0% and critical path delay by 6.5% in our test case.

Stress-driven 3D-IC placement with TSV keep-out zone and regularity study

Through-silicon via (TSV) fabrication causes tensile stress around TSVs which results in significant carrier mobility variation in the devices in their neighborhood. Keep-out zone (KOZ) is a conservative way to prevent any devices/cells from being impacted by the TSV-induced stress. However, owing to already large TSV size, large KOZ can significantly reduce the placement area available for cells, thus requiring larger dies which negate improvement in wirelength and timing due to 3D integration. In this paper, we study the impact of KOZ dimension on stress, carrier mobility variation, area, wirelength, and performance of 3D ICs. We demonstrate that, instead of requiring large KOZ, 3D-IC placers must exploit TSV stress-induced carrier mobility variation to improve the timing and area objectives during placement. We propose a new TSV stress-driven force-directed 3D placement that consistently provides placement result with, on average, 21.6% better worst negative slack (WNS) and 28.0% better total negative slack (TNS) than wirelength-driven placement.

Design and analysis of 3D-MAPS: A many-core 3D processor with stacked memory

We describe the design and analysis of 3D-MAPS, a 64-core 3D-stacked memory-on-processor running at 277 MHz with 63 GB/s memory bandwidth, sent for fabrication using Tezzarons 3D stacking technology. We also describe the design flow used to implement it using industrial 2D tools and custom add-ons to handle 3D specifics.

Study of Through-Silicon-Via Impact on the 3-D Stacked IC Layout

The technology of through-silicon vias (TSVs) enables fine-grained integration of multiple dies into a single 3-D stack. TSVs occupy significant silicon area due to their sheer size, which has a great effect on the quality of 3-D integrated chips (ICs). Whereas well-managed TSVs alleviate routing congestion and reduce wirelength, excessive or ill-managed TSVs increase the die area and wirelength. In this paper, we investigate the impact of the TSV on the quality of 3-D IC layouts. Two design schemes, namely TSV co-placement (irregular TSV placement) and TSV site (regular TSV placement), and accompanying algorithms to find and optimize locations of gates and TSVs are proposed for the design of 3-D ICs. Two TSV assignment algorithms are also proposed to enable the regular TSV placement. Simulation results show that the wirelength of 3-D ICs is shorter than that of 2-D ICs by up to 25%.

Design for manufacturability and reliability for TSV-based 3D ICs

The 3D IC integration using through-silicon-vias (TSV) has gained tremendous momentum recently for industry adoption. However, as TSV involves disruptive manufacturing technologies, new modeling and design techniques need to be developed for 3D IC manufacturability and reliability. In particular, TSVs in 3D IC may cause significant thermal mechanical stress, which not only results in systematic mobility/performance variations, but also leads to mechanical reliability concerns such as interfacial cracking. Meanwhile, the huge dimensional gaps between TSV, on-chip wires, and bonding/packaging all lead to new electromigration concerns. Thus full-chip/package modeling and physical design tools need to be developed to achieve more reliable 3D IC integration. In this paper, we will discuss some key design for manufacturability and reliability challenges and possible solutions for TSV-based 3D IC integration, as well as future research directions.

Design and Analysis of 3D-MAPS (3D Massively Parallel Processor with Stacked Memory)

This paper describes the architecture, design, analysis, and simulation and measurement results of the 3D-MAPS (3D massively parallel processor with stacked memory) chip built with a 1.5 V, 130 nm process technology and a two-tier 3D stacking technology using 1.2 \microm-diameter, 6 \micro m-height through-silicon vias (TSVs) and 3.4\nbsp\microm-diameter face-to-face bond pads. 3D-MAPS consists of a core tier containing 64 cores and a memory tier containing 64 memory blocks. Each core communicates with its dedicated 4KB SRAM block using face-to-face bond pads, which provide negligible data transfer delay between the core and the memory tiers. The maximum operating frequency is 277 MHz and the maximum memory bandwidth is 70.9 GB/s at 277 MHz. The peak measured memory bandwidth usage is 63.8 GB/s and the peak measured power is approximately 4 W based on eight parallel benchmarks.

Backend low-k TDDB chip reliability simulator

Backend low-k time-dependent dielectric breakdown degrades reliability of circuits with Copper metallization. We present test data and link it to a methodology to evaluate chip lifetime due to low-k time-dependent dielectric breakdown. Other failure mechanisms can be integrated into our methodology. We analyze several layouts using our methodology and present the results to show that the methodology can enable the designer to consider easy design modifications and their impact on lifetime, separate from the design rules.

Exploiting Die-to-Die Thermal Coupling in 3-D IC Placement

In this paper, we propose two methods used in 3-D IC placement that efficiently exploit the die-to-die thermal coupling in the stack. First, through-silicon vias (TSVs) are spread on each die to reduce the local power density and vertically aligned across dies simultaneously to increase thermal conductivity to the heatsink. Second, we move high-power logic cells to the location that has higher conductivity to the heatsink while moving TSVs in the upper dies so that high-power cells are vertically overlapping below the TSVs. These methods are employed in a force-directed 3-D placement successfully and outperform several state-of-the-art placers published in recent literature. We obtain 3-D placement results with shorter routed wirelength at similar temperature. We also obtain 3-D placement results with lower temperatures at similar routed wirelengths.