Kunihiko Iwamoto

Metallic compound thin film that contains high-k dielectric metal, nitrogen, and oxygen

Method of forming a metal oxide thin film

Semiconductor device, process for producing the same and process for producing metal conmpound thin film

Semiconductor device, process for producing the same and process for producing metal compound thin film

Method of fabricating a metal oxynitride thin film that includes a first annealing of a metal oxide film in a nitrogen-containing atmosphere to form a metal oxynitride film and a second annealing of the metal oxynitride film in an oxidizing atmosphere

Metal thin film and semiconductor comprising a metal thin film

Method for forming an insulating film in a semiconductor device

Partial Silicides Technology for Tunable Work Function Electrodes on High-j Dielectrics

Non-volatile memory cell in semiconductor device

Method of manufacturing non-volatile memory cell with simplified step of forming floating gate