Kyung-dae Kim

Pedestal of a load-cup which supports wafers loaded/unloaded onto/from a chemical mechanical polishing apparatus

System and method for drying semiconductor substrate

Resist and etching by-product removing composition and resist removing method using the same

Polishing head of a chemical mechanical polishing apparatus and, retainer ring of the same

Cleaning solution and method of cleaning anti-reflective coating composition using the same

Cleaning solution for removing anti-reflective coating composition

System und Verfahren zum Trocknen von Halbleitersubstraten System and method for drying semiconductor substrates

Composition useful for removing resist layers in the manufacture of semiconductor devices comprises an N-hydroxyalkyl alkoxyalkanamide and a swelling agent

Zusammensetzung und Verfahren zur Resistentfernung Composition and method for resist removal

Zusammensetzung und Verfahren zur Resistentfernung