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Dive into the research topics where Lars Wischmeier is active.

Publication


Featured researches published by Lars Wischmeier.


Archive | 2013

EUV lithography system

Udo Dinger; Lars Wischmeier; Markus Hauf; Stephan Kellner; Igor Gurevich; Markus Deguenther


Archive | 2012

Vermessung eines abbildenden optischen Systems durch Überlagerung von Mustern

Lars Wischmeier; Rolf Freimann


Archive | 2010

Optical component e.g. projection lens, manufacturing method for microlithography to produce fine structures, involves determining distance to mirror arrangement by distance measuring system according to principle of laser triangulation

Lars Wischmeier


Archive | 2016

Method for illuminating an object field of a projection exposure system

Martin Endres; Johannes Eisenmenger; Stig Bieling; Markus Hauf; Lars Wischmeier; Fabian Haacker


Archive | 2015

Lithography apparatus and method of manufacturing devices

Schoot Jan Bernard Plechelmus Van; Stig Bieling; Martin Endres; Marun Maryana Escalante; Toralf Gruner; Lars Wischmeier


Archive | 2015

Verfahren zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage

Martin Endres; Johannes Eisenmenger; Stig Bieling; Markus Hauf; Lars Wischmeier; Fabian Zimmer


Archive | 2014

Spiegel-Array Mirror array

Stig Bieling; Markus Hauf; Lars Wischmeier; Fabian Zimmer; Martin Endres; Johannes Eisenmenger


Archive | 2014

A method for illuminating an object field of a projection exposure apparatus

Martin Endres; Johannes Eisenmenger; Stig Bieling; Markus Hauf; Lars Wischmeier; Fabian Zimmer


Archive | 2013

Extreme UV (EUV) lithography system used for manufacturing miniaturized component, has mirror elements which produce image on picture plane such that spacing between mirror elements and plane, and plane and screen is maximum/minimum

Markus Degünther; Igor Gurevich; Udo Dinger; Markus Hauf; Lars Wischmeier; Stephan Kellner


Archive | 2012

MEASUREMENT OF AN IMAGING OPTICAL SYSTEM BY SUPERPOSITION OF PATTERNS

Lars Wischmeier; Rolf Freimann

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