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Liang-Yuh Chen

Applied Materials

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Publication

Featured researches published by Liang-Yuh Chen.

Archive | 1997

Reactive preclean prior to metallization for sub-quarter micron application

Suchitra Subrahmanyan; Liang-Yuh Chen; Roderick Craig Mosely

Archive | 1997

Dual damascene metallization

Liang-Yuh Chen; Rong Tao; Ted Guo; Roderick Craig Mosely

Archive | 1997

Low temperature integrated via and trench fill process and apparatus

Liang-Yuh Chen; Roderick Craig Mosely; Fusen Chen; Rong Tao; Ted Guo

Archive | 1996

Semi-selective chemical vapor deposition

Roderick Craig Mosely; Liang-Yuh Chen; Ted Guo

Archive | 2003

Fully planarized dual damascene metallization using copper line interconnect and selective CVD aluminum plug

Liang-Yuh Chen; Ted Guo; Roderick Craig Mosley; Fusen Chen

Archive | 2000

Single step process for blanket-selective cvd aluminum deposition

Ted Guo; Liang-Yuh Chen; Mehul Naik; Roderick Craig Mosely

Archive | 1997

In-situ capped aluminum plug (CAP) process using selective CVD AL for integrated plug/interconnect metallization

Ted Guo; Liang-Yuh Chen; Suchitra Subrahmanyan

Archive | 1998

Metallization process and method

Mehul Naik; Ted Guo; Liang-Yuh Chen; Roderick Craig Mosely; Israel Beinglass

Archive | 1998

Integrated CVD/PVD Al planarization using ultra-thin nucleation layers

Liang-Yuh Chen; Mehul Naik; Ted Guo; Roderick Craig Mosely

Archive | 1997

Integrated nitrogen-treated titanium layer to prevent interaction of titanium and aluminum

Liang-Yuh Chen; Ted Guo; Roderick Craig Mosely

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Collaboration

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Roderick Craig Mosely

Applied Materials

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Ted Guo

Applied Materials

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Fusen Chen

Applied Materials

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Mehul Naik

Applied Materials

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Rong Tao

Applied Materials

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Suchitra Subrahmanyan

Applied Materials

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Israel Beinglass

Applied Materials

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Jing-Pei Chou

Applied Materials

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Roderick Craig Mosley

Applied Materials

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Wei Shi

Applied Materials

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