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Marc Kirch

Carl Zeiss AG

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Publication

Featured researches published by Marc Kirch.

Archive | 2009

Illumination optics for euv microlithography and illumination system and projection exposure apparatus comprising an illumination optics of this type

Damian Fiolka; Berndt Warm; Christian Steigerwald; Martin Endres; Ralf Stützle; Jens Ossmann; Ralf Scharnweber; Markus Hauf; Udo Dinger; Severin Waldis; Marc Kirch; Joachim Hartjes

Archive | 2010

Illumination optics for EUV microlithography and related system and apparatus

Damian Fiolka; Berndt Warm; Christian Steigerwald; Martin Endres; Ralf Stuetzle; Jens Ossmann; Ralf Scharnweber; Markus Hauf; Udo Dinger; Severin Waldis; Marc Kirch; Joachim Hartjes

Archive | 2010

ILLUMINATION OPTICAL UNIT FOR EUV MICROLITHOGRAPHY

Martin Endres; Sebastian Doern; Stig Bieling; Marc Kirch

Archive | 2012

Optical element having a plurality of reflective facet elements

Marc Kirch; Martin Endres; Damian Fiolka; Joachim Hartjes

Archive | 2011

Field facet mirror for use in illumination lens in illumination system of projection exposure system, during extreme UV-projection-lithography to manufacture semiconductor chip, has reference bodies arranged in reference levels with vectors

Stig Bieling; Martin Endres; Marc Kirch; Markus Walter; Markus Hauf

Archive | 2011

Optisches Element mit einer Mehrzahl von refletiven Facettenelementen

Marc Kirch; Martin Endres; Damian Fiolka; Joachim Hartjes

Archive | 2015

Lighting optical unit for euv microlithography

エントレス マルティン; Martin Endres; デルン ゼバスチャン; Sebastian Doern; ビーリンク シュティーク; Stig Bieling; キルヒ マルク; Marc Kirch

Archive | 2011

Système optique d'éclairage pour lithographie par projection uve

Michael Patra; Olaf Dittmann; Marc Kirch; Martin Endres; Markus Walter; Stig Bieling; Sebastian Dörn

Archive | 2010

System for illuminating reticle in microlithography-projection exposure system, during formation of structures in wafer in e.g. semi-conductor industry, has radiation formation unit to adjust form of surface to optical elements

Carsten Ruß; Markus Degünther; Gundula Weiß; Dieter Bader; Marc Kirch; Marcus Reicherter

Archive | 2010

OPTISCHE BELEUCHTUNGSEINHEIT FÜR DIE EUV- MIKROLITHOGRAFIE

Martin Endres; Sebastian Dörn; Stig Bieling; Marc Kirch

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Collaboration

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Martin Endres

Carl Zeiss AG

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Damian Fiolka

Carl Zeiss AG

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Stig Bieling

Carl Zeiss AG

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Joachim Hartjes

Carl Zeiss AG

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Markus Degünther

Carl Zeiss AG

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Markus Hauf

Carl Zeiss AG

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Sebastian Dörn

Carl Zeiss AG

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Berndt Warm

Carl Zeiss AG

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Christian Steigerwald

Carl Zeiss AG

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Gerhard-Wilhelm Ziegler

Carl Zeiss AG

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