Marc Michael Kollrack

Plasma CVD of silicon nitride thin films on large area glass substrates at high deposition rates

Method for multilayer CVD processing in a single chamber

Method of limiting sticking of body to susceptor in a deposition treatment

Method for depositing amorphous silicon thin films onto large area glass substrates by chemical vapor deposition at high deposition rates

Method of plasma chemical vapor deposition of layer with improved interface

Method of limiting sticking of a body on the support at a deposition treatment

Verfahren zur Begrenzung des Haftens eines Körpers am Träger bei einer Abscheidungs-Behandlung A method of limiting sticking of a body on the support at a deposition treatment

Procédé pour le plasma-dépôt chimique en phase vapeur de souches ayant une interface améliorée

A method for plasma enhanced chemical vapor deposition of layers from the vapor phase to improve the interfacial

Verfahren zur CVD-Beschichtung einer Mehrschichtstruktur in einer einzigen Kammer A process for the CVD coating of a multilayer structure in a single chamber