Robert Robertson

Method for depositing ozone/TEOS silicon oxide films of reduced surface sensitivity

Method and apparatus for protection of conductive surfaces in a plasma processing reactor

Dual frequency excitation of plasma for film deposition

Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology

Single chamber CVD process for thin film transistors

Plasma CVD of silicon nitride thin films on large area glass substrates at high deposition rates

Method for multilayer CVD processing in a single chamber

Film deposition using a finger type shadow frame

Method of limiting sticking of body to susceptor in a deposition treatment

Deposition of high quality conformal silicon oxide thin films for the manufacture of thin film transistors