Markus Kirchhoff

Method for forming an insulator having a low dielectric constant on a semiconductor substrate

Photolithographic patterning process using a carbon hard mask layer of diamond-like hardness produced by a plasma-enhanced deposition process

Method for forming a trench in a semiconductor substrate

Method for filling trenches in integrated semiconductor circuits

Method for production of a semiconductor structure

Method for fabricating an integrated semiconductor circuit to prevent formation of voids

Method for photolithographic structuring by means of a carbon hard mask layer which has a diamond-like hardness and is deposited by means of a plasma method

Contact hole forming method for semiconductor arrangement forming and structuring masking layers on dielectric layer and strip conductor and forming adjustable contact hole

Photolithographic method for forming a structure in a semiconductor substrate

Production of an insulator used in electronic circuits comprises forming a first conducting pathway and a second conducting pathway on a semiconductor substrate using conducting silicon