Mary E. Rothwell | Researchain

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Featured researches published by Mary E. Rothwell.

Langmuir | 2002

Patterning indium tin oxide and indium zinc oxide using microcontact printing and wet etching

Tricia L. Breen; Peter M. Fryer; Ronald W. Nunes; Mary E. Rothwell

Archive | 2010

Lock and key through-via method for wafer level 3 D integration and structures produced

Sampath Purushothaman; Mary E. Rothwell; Ghavam G. Shahidi; Roy Yu

Archive | 2000

Method of forming patterned indium zinc oxide and indium tin oxide films via microcontact printing and uses thereof

Tricia L. Breen; Peter M. Fryer; Ronald W. Nunes; Mary E. Rothwell

Archive | 2013

Suspended superconducting qubits

Josephine B. Chang; George A. Keefe; Chad Rigetti; Mary E. Rothwell

Archive | 2003

Self-assembled monolayer etch barrier for indium-tin-oxide useful in manufacturing thin film transistor-liquid crystal displays

Stephen L. Buchwalter; Gareth G. Hougham; Kang-Wook Lee; John J. Ritsko; Mary E. Rothwell; Peter M. Fryer

Archive | 2011

Low-loss superconducting devices

Antonio D. Corcoles Gonzalez; Jiansong Gao; Dustin A. Hite; George A. Keefe; David P. Pappas; Mary E. Rothwell; Matthias Steffen; Chang C. Tsuei; Michael Vissers; David Scott Wisbey

Archive | 2002

Multilayer architechture for microcontact printing stamps

Gareth G. Hougham; Mary E. Rothwell; Ronald W. Nunes

Archive | 2015

Removal of spurious microwave modes via flip-chip crossover

David W. Abraham; Jerry M. Chow; Antonio D. Corcoles Gonzalez; George A. Keefe; Mary E. Rothwell; James R. Rozen; Matthias Steffen

Archive | 2013

Chip mode isolation and cross-talk reduction through buried metal layers and through-vias

David W. Abraham; George A. Keefe; Christian Lavoie; Mary E. Rothwell

MRS Proceedings | 1998

High Conductivity Gate Metallurgy for Tft/Lcd's

Peter M. Fryer; Evan G. Colgan; Eileen A. Galligan; William S. Graham; Raymond Robert Horton; Leslie Charles Jenkins; Richard A. John; Yue Kuo; Kenneth F. Latzko; Frank R. Libsch; A. Lien; Robert Wayne Nywening; Robert J. Polastre; Mary E. Rothwell; J. Wilson; Robert L. Wisnieff; S. L. Wright

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