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Dive into the research topics where Masaaki Okunaka is active.

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Featured researches published by Masaaki Okunaka.


Applied Physics Letters | 1992

New method of measuring second harmonic generation efficiency using powder crystals

Masashi Kiguchi; Midori Kato; Masaaki Okunaka; Yoshifumi Taniguchi

A new method of measuring second‐harmonic generation (SHG) efficiency using powder crystals is proposed. The second harmonic, which is generated by the evanescent wave under total reflection conditions, is phase matched for every element of the second‐order optical nonlinear coefficient, whether each element is phase matchable in a bulk crystal or not. Observing this phase‐matched second‐harmonic power gives the SHG efficiency, regardless of the phase matchability in a bulk crystal, even if powder crystals are used as a sample.


Journal of Molecular Structure | 1998

THE STRUCTURE AND NONLINEAR OPTICAL PROPERTIES OF 3-N-PROPYLAMIDE-4-(4-HEXYLOXYPHENYLETHYNYL)-NITROBENZENE

Midori Kato; Kimiko Kobayashi; Masaaki Okunaka; Nami Sugita; Masashi Kiguchi; Yoshio Taniguchi

Abstract We have synthesized the tolane derivative 3- n -propylamide-4-(4-hexyloxyphenylethynyl)-nitrobenzene 1 and examined its second-order nonlinear properties and crystal structure. Compound 1 crystallizes in the space group C1c1 with a =27.667(6), b =4.910(2), c =20.856(3) A, β =128.36(3)° and Z =4, and shows a high second-order nonlinear optical efficiency. It has an intermolecular hydrogen bond between CO and N–H in the amide group. This hydrogen bond plays an important role in forming a non-centrosymmetric structure appropriate for nonlinear optical materials.


CIRP Annals | 1992

Laser microformation of thin film on glass substrate for repair of transparent defects on high-density masks

Tateoki Miyauchi; Mikio Hongo; Katsurou Mizukoshi; Masaaki Okunaka; Takao Kawanabe; Yasuhiro Koizumi; N. Taniguchi

Summary A new technique is developed for repairing transparent defects on high density masks for VLSI. A thin Ag-Ta organometallic film is first spin-coated onto a photomask and baked. Then an Ar laser microspot is applied to a small area on this film. After rinsing the mask with a solvent, an opaque layer remains at the laser-irradiated spot and the rest of the organometallic material is washed away. The opaque film formed locally by laser irradiation is dense enough to prevent light transmission and durable enough to withstand repeated washing with strong alkali and acid solutions.


Archive | 2005

Organic EL display device

Kazuhiko Kai; Masaaki Okunaka; Naoyuki Ito


Archive | 1995

Method and apparatus for inspection and correction of wiring of electronic circuit and for manufacture thereof

Shigenobu Maruyama; Mikio Hongo; Satoru Todoroki; Masaaki Okunaka; Hideo Matsuzaki; Takanori Ninomiya; Kazushi Yoshimura; Fumikazu Ito


Archive | 1983

Process for forming thin film

Kazufumi Azuma; Mitsuo Nakatani; Kazuo Nate; Masaaki Okunaka; Hitoshi Yokono


Archive | 1982

Method and apparatus for redressing defective photomask

Tateoki Miyauchi; Katsuro Mizukoshi; Mikio Hongo; Masao Mitani; Masaaki Okunaka; Takao Kawanabe; Isao Tanabe


Archive | 1982

Method and apparatus for correcting transparent defects on a photomask

Mikio Hongo; Masao Mitani; Tateoki Miyauchi; Masaaki Okunaka; Katsuro Mizukoshi


Archive | 1983

Photomask with corrected white defects

Masaaki Okunaka; Katsuro Mizukoshi; Mikio Hongo; Tateoki Miyauchi


Archive | 1984

Process for producing solar cells

Masaaki Okunaka; Mitsuo Nakatani; Haruhiko Matsuyama; Hitoshi Yokono; Tokio Isogai; Tadashi Saitoh; Kunihiro Matsukuma; Sumiyuki Midorikawa; Satoru Suzuki

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