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Featured researches published by Tateoki Miyauchi.


CIRP Annals | 1983

Laser Diffusion Connection Technology for VLSI Programming

Tateoki Miyauchi; Mikio Hongo; Toshiaki Masuhara; Osamu Minato; Takao Kawanabe; Kouichi Nagasawa; Norio Taniguchi

Summary A laser diffusion technology to connect poly-silicon conductors for programming VLSI memories is developed. It is based on the fact that a Nitrogen laser pumped dye laser of 510 nm wavelength irradiated on an intrinsic poly-silicon film in a VLSI, having 10 10 2 resistivity, decreases the film resistivity to 10 3 Ω. The mechanism of resistivity reduction is due to the laser heat diffusion of impurity into the intrinsic poly-silicon film. It is also clarified that the passivation film thick-ness on the intrinsic poly-silicon film changes laser reflectivity from zero to over 50%, affecting the condition of the process. The practical processing condition of laser diffusion connection for VLSI programming to enhance chip yield without damage is obtained.


CIRP Annals | 1992

Laser microformation of thin film on glass substrate for repair of transparent defects on high-density masks

Tateoki Miyauchi; Mikio Hongo; Katsurou Mizukoshi; Masaaki Okunaka; Takao Kawanabe; Yasuhiro Koizumi; N. Taniguchi

Summary A new technique is developed for repairing transparent defects on high density masks for VLSI. A thin Ag-Ta organometallic film is first spin-coated onto a photomask and baked. Then an Ar laser microspot is applied to a small area on this film. After rinsing the mask with a solvent, an opaque layer remains at the laser-irradiated spot and the rest of the organometallic material is washed away. The opaque film formed locally by laser irradiation is dense enough to prevent light transmission and durable enough to withstand repeated washing with strong alkali and acid solutions.


Archive | 1982

Ion beam processing apparatus and method of correcting mask defects

Hiroshi Yamaguchi; Tateoki Miyauchi; Akira Shimase; Mikio Hongo


Archive | 1984

Method and apparatus for correcting delicate wiring of IC device

Hiroshi Yamaguchi; Akira Shimase; Tateoki Miyauchi; Mikio Hongo


Archive | 1996

Laser cleavage cutting method and system

Takashi Matsumoto; Shinichi Kazui; Hideaki Sasaki; Tateoki Miyauchi; Tatsuji Sakamoto


Archive | 1975

Laser working apparatus

Tateoki Miyauchi; Junichi Nakabayashi; Tomoyoshi Mikoshiba


Archive | 1991

Method of cutting interconnection pattern with laser and apparatus thereof

Tateoki Miyauchi; Mikio Hongo; Shigenobu Maruyama; Katsurou Mizukoshi; Hiroshi Yamaguchi; Koyo Morita


Archive | 1982

Method and apparatus for redressing defective photomask

Tateoki Miyauchi; Katsuro Mizukoshi; Mikio Hongo; Masao Mitani; Masaaki Okunaka; Takao Kawanabe; Isao Tanabe


Archive | 1987

IC wiring connecting method and resulting article

Hiroshi Yamaguchi; Mikio Hongo; Tateoki Miyauchi; Akira Shimase; Satoshi Haraichi; Takahiko Takahashi; Keiya Saito


Archive | 1982

Method and apparatus for correcting transparent defects on a photomask

Mikio Hongo; Masao Mitani; Tateoki Miyauchi; Masaaki Okunaka; Katsuro Mizukoshi

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