Masaharu Kawakubo
Nikon
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Publication
Featured researches published by Masaharu Kawakubo.
Metrology, inspection, and process control for microlithography. Conference | 2006
Ayako Sukegawa; Shinji Wakamoto; Shinichi Nakajima; Masaharu Kawakubo; Nobutaka Magome
Overlay accuracy is a key issue in the semiconductor manufacturing process. To achieve overlay requirements, we developed compensation functions, i.e. Enhanced Global Alignment (EGA), Super Distortion Matching (SDM), and Grid Compensation for Matching (GCM). These functions are capable to reduce all the components except local linear components caused by a wafer global deformation. In this paper we introduce a novel correction framework which includes new compensation function called Shot Correction by Grid Parameter; thereby enabling further enhancements to overlay. Using this novel framework, we show both simulation and experimental data demonstrating improved overlay accuracy.
Archive | 2002
Masahiko Yasuda; Osamu Furukawa; Masaharu Kawakubo; Hiroki Tateno; Nobutaka Magome
Archive | 1999
Masaharu Kawakubo; Ryoichi Kaneko
Archive | 1996
Masaharu Kawakubo; Masahiko Okumura
Archive | 1995
Kazuya Ota; Masaharu Kawakubo; Kenji Nishi
Archive | 2005
Masaharu Kawakubo
Archive | 2000
Masaharu Kawakubo
Archive | 1996
Masaharu Kawakubo; Ryoichi Kaneko
Archive | 1995
Kenji Nishi; Nobutaka Magome; Masaharu Kawakubo
Archive | 2006
Masaharu Kawakubo
