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Dive into the research topics where Masanobu Hatanaka is active.

Publication


Featured researches published by Masanobu Hatanaka.


international interconnect technology conference | 2011

ZrBO dielectrics for TSV production process

Masanobu Hatanaka; Akihiro Shibata; Masamichi Harada; Satoru Toyoda; Michio Ishikawa; Koukou Suu

Dielectric films of ZrBO were grown using thermal-CVD Zr(BH4)4-O2 gas system. Oxygen gas was activated by microwave to produce its radical. The grown film showed high barrier properties for Cu diffusion with a thickness of 50 nm. Typical side step coverage was over 60% for a 45-µm-deep and 7.5-aspect-ratio TSV with a high coverage of 67% at the bottom. We report ZrBO-CVD mechanism related to the coverage.


Archive | 2008

Vacuum film-forming apparatus

Masanobu Hatanaka; Michio Ishikawa; Se-Ju Lim; Fumio Nakamura


Applied Surface Science | 2009

Low temperature deposited Zr–B film applicable to extremely thin barrier for copper interconnect

Mayumi B. Takeyama; Atsushi Noya; Yasuo Nakadai; Shozo Kambara; Masanobu Hatanaka; Yuichiro Hayasaka; Eiji Aoyagi; Hideaki Machida; Kazuya Masu


Archive | 2005

Vaccum film-forming apparatus

Masanobu Hatanaka; Michio Ishikawa; Se-Ju Lim; Fumio Nakamura


Archive | 2008

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS

Masanobu Hatanaka; Kanako Tsumagari; Michio Ishikawa


Archive | 2006

Method for producing component for vacuum apparatus, resin coating forming apparatus and vacuum film forming system

Masanobu Hatanaka; Yoshikazu Takahashi; Michio Ishikawa; Fumio Nakamura


Archive | 2007

Procédé de fabrication de film barrière

Masanobu Hatanaka; Michio Ishikawa; Kanako Tsumagari


The Japan Society of Applied Physics | 2003

CVD-Al/Flow-Al Technology for Filling Large Aspect Ratio Contact Holes

Manabu Sakamoto; Tomoharu Aoki; Kazuya Masu; Se Ju Lim; Masanobu Hatanaka; Michio Ishikawa; Yuji Furumura


Archive | 1991

Verfahren zur bildung eines siliciumoxid-filmes A process for the formation of a silica-filmes

Atsuhiro Tsukune; Yuji Furumura; Masanobu Hatanaka


Archive | 1991

A method for forming a silicon oxide film

Atsuhiro Tsukune; Yuji Furumura; Masanobu Hatanaka

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Kazuya Masu

Tokyo Institute of Technology

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Atsushi Noya

Kitami Institute of Technology

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Mayumi B. Takeyama

Kitami Institute of Technology

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