Kazuya Masu

Process for forming deposited film by use of alkyl aluminum hydride

Gas feeding device for controlled vaporization of an organometallic compound used in deposition film formation

Deposited film formation method utilizing selective deposition by use of alkyl aluminum hydride

Process for forming deposited film

Apparatus for vaporizing liquid raw material and apparatus for forming thin film

Metal film forming method

Plasma CVD of aluminum films

Process for non-selectively forming deposition film on a non-electron-donative surface

Process for thin film formation

Process for forming metal deposited film containing aluminum as main component by use of alkyl hydride